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dc.contributor.authorLogan, JV
dc.contributor.authorWoller, KB
dc.contributor.authorWebster, PT
dc.contributor.authorMorath, CP
dc.contributor.authorShort, MP
dc.date.accessioned2024-09-19T19:17:05Z
dc.date.available2024-09-19T19:17:05Z
dc.date.issued2023-12-14
dc.identifier.urihttps://hdl.handle.net/1721.1/156906
dc.description.abstractVacancies are generated in semiconductor devices while operating in the space radiation environment, impacting semiconductor carrier concentrations and dynamics. Positron annihilation lifetime spectroscopy (PALS) is used to probe these defect concentrations in bulk grown GaN, GaP, InAs, InP, Si, MgO, and ZnO both as-grown and as a function of 2–4 MeV proton irradiation. All samples were irradiated to yield a common initial damage production and characterized identically. In as-grown samples, PALS reveals vacancy concentrations above the saturation limit in the oxides, disabling further analysis. As a function of dose, of the materials in which defect accumulation could be probed, it is observed that GaN is the most resistant to the accumulation of defects (attributed to the Ga vacancies) and Si is the least. GaP (attributed to the Ga vacancy) and InAs exhibit slightly higher rates of vacancy accumulation than GaN. InP exhibits high defect accumulation rates approaching that of Si. This information is key to understanding the operation of a diverse set of semiconductors in the space radiation environment.en_US
dc.language.isoen
dc.publisherAIP Publishingen_US
dc.relation.isversionof10.1063/5.0147324en_US
dc.rightsCreative Commons Attributionen_US
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/en_US
dc.sourceAIP Publishingen_US
dc.titleOpen volume defect accumulation with irradiation in GaN, GaP, InAs, InP, Si, ZnO, and MgOen_US
dc.typeArticleen_US
dc.identifier.citationJ. V. Logan, K. B. Woller, P. T. Webster, C. P. Morath, M. P. Short; Open volume defect accumulation with irradiation in GaN, GaP, InAs, InP, Si, ZnO, and MgO. J. Appl. Phys. 14 December 2023; 134 (22): 225701.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Nuclear Science and Engineeringen_US
dc.relation.journalJournal of Applied Physicsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2024-09-19T19:10:37Z
dspace.orderedauthorsLogan, JV; Woller, KB; Webster, PT; Morath, CP; Short, MPen_US
dspace.date.submission2024-09-19T19:10:42Z
mit.journal.volume134en_US
mit.journal.issue22en_US
mit.licensePUBLISHER_CC
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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