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dc.contributor.authorSweetland, Matthew
dc.contributor.authorLienhard, John H
dc.date.accessioned2025-07-21T18:37:35Z
dc.date.available2025-07-21T18:37:35Z
dc.date.issued2003-01-29
dc.identifier.issn0022-1481
dc.identifier.issn1528-8943
dc.identifier.urihttps://hdl.handle.net/1721.1/161622
dc.description.abstractActive control of the die-level temperature is desirable during production testing of high power microprocessors, so as to ensure accurate performance classification. Such control requires that the controlling thermal load time-lead the dissipated thermal load and that it be modulated to account for the distributed thermal capacitance and resistance of the device packaging. The analysis in this paper demonstrates fundamental limits of temperature control for typical devices under test conditions. These limits are identified for specified control power to die power ratios. The effects of test sequence design and device package design on the temperature control limits are also examined. The theory developed can be applied to any thermal control problem where a conductive medium separates the control source from the location where control is desired.en_US
dc.description.sponsorshipTeradyne, Inc.en_US
dc.publisherASME Internationalen_US
dc.relation.isversionof10.1115/1.1527908en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceAuthoren_US
dc.titleActive Thermal Control of Distributed Parameter Systems With Application to Testing of Packaged IC Devicesen_US
dc.typeArticleen_US
dc.identifier.citationSweetland, M., and Lienhard, J. H., V (January 29, 2003). "Active Thermal Control of Distributed Parameter Systems With Application to Testing of Packaged IC Devices ." ASME. J. Heat Transfer. February 2003; 125(1): 164–174.en_US
dc.relation.journalASME Journal of Heat Transferen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.identifier.doi10.1115/1.1527908
dspace.date.submission2025-07-19T20:21:16Z
mit.journal.volume125en_US
mit.journal.issue1en_US
mit.licensePUBLISHER_POLICY
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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