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dc.contributor.authorBenderly-Kremen, Ethan
dc.contributor.authorDaehn, Katrin
dc.contributor.authorAllanore, Antoine
dc.date.accessioned2025-10-10T16:15:28Z
dc.date.available2025-10-10T16:15:28Z
dc.date.issued2025-08-25
dc.identifier.urihttps://hdl.handle.net/1721.1/163150
dc.description.abstractGallium (Ga) and indium (In) share similarities in their chemical behavior, their dilute presence in waste electronics (e-waste), and recycling rates close to 0% from such streams. Designing processes to extract gallium from LED chips and indium from LCD screens simultaneously reveals the potential and necessary distinctions for a flexible process based on elemental sulfur reactivity, which can be applied to both feedstocks. Whereas Ga- and In-compounds found in e-waste (gallium nitride, GaN; indium tin oxide, ‘ITO’) are recalcitrant to dissolution in aqueous feedstocks, the reaction with sulfur gas to form volatile sulfides may support their selective extraction from prepared e-waste. Process conditions for selective sulfidation are herein informed from thermodynamics and demonstrated experimentally. Vapor phase transport of the volatile sulfides is a powerful means to collect and enrich gallium and indium. Practical implementation likely calls for physical separation approaches to disassemble e-waste, remove excess material (epoxy, glass, metallic leads, and housing) from LED chips, and expose the ITO layer within LCD screens.en_US
dc.publisherSpringer USen_US
dc.relation.isversionofhttps://doi.org/10.1007/s11837-025-07623-5en_US
dc.rightsCreative Commons Attributionen_US
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/en_US
dc.sourceSpringer USen_US
dc.titleGallium and Indium Selective Sulfidation and Vapor Phase Transport from e-Waste Feedstocksen_US
dc.typeArticleen_US
dc.identifier.citationBenderly-Kremen, E., Daehn, K. & Allanore, A. Gallium and Indium Selective Sulfidation and Vapor Phase Transport from e-Waste Feedstocks. JOM 77, 7415–7434 (2025).en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.relation.journalJOMen_US
dc.identifier.mitlicensePUBLISHER_CC
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2025-10-08T14:40:58Z
dc.language.rfc3066en
dc.rights.holderThe Author(s)
dspace.embargo.termsN
dspace.date.submission2025-10-08T14:40:58Z
mit.journal.volume77en_US
mit.licensePUBLISHER_CC
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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