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dc.contributor.authorLi, Yifei
dc.contributor.authorReidy, Kate
dc.contributor.authorPenn, Aubrey
dc.contributor.authorLee, Seng Huat
dc.contributor.authorWang, Baoming
dc.contributor.authorYe, Kevin
dc.contributor.authorMao, Zhiqiang
dc.contributor.authorRoss, Frances M
dc.contributor.authorJaramillo, R
dc.date.accessioned2026-02-10T15:57:50Z
dc.date.available2026-02-10T15:57:50Z
dc.date.issued2023-02-16
dc.identifier.urihttps://hdl.handle.net/1721.1/164771
dc.description.abstractWe report the synthesis of large-area, high-Ti-content, Mo1−xTixS2 alloy thin films in the 2H phase at temperature as low as 500 °C using a scalable two-step method of metal film deposition, followed by sulfurization in H2S. Film processing at higher temperature accelerates Ti segregation, film coarsening, and the formation of TiS2 in the 1T phase. Crystal growth at higher temperature results in the formation of multiple binary sulfide phases, in agreement with the equilibrium phase diagram. Making highly metastable, smooth, and uniform single-phase alloy films, therefore, hinges on developing low-temperature processing. Our results are relevant to the development of technologies based on designer transition metal dichalcogenide alloys, including in photonic integrated circuits and gas sensing.en_US
dc.language.isoen
dc.publisherAIP Publishingen_US
dc.relation.isversionofhttps://doi.org/10.1116/6.0002227en_US
dc.rightsCreative Commons Attributionen_US
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/en_US
dc.sourceAIP Publishingen_US
dc.titleStabilizing far-from-equilibrium (Mo,Ti)S2 thin films by metal sulfurization at reduced temperatureen_US
dc.typeArticleen_US
dc.identifier.citationYifei Li, Kate Reidy, Aubrey Penn, Seng Huat Lee, Baoming Wang, Kevin Ye, Zhiqiang Mao, Frances M. Ross, R. Jaramillo; Stabilizing far-from-equilibrium (Mo,Ti)S2 thin films by metal sulfurization at reduced temperature. J. Vac. Sci. Technol. A 1 March 2023; 41 (2): 023405.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.departmentMIT.nanoen_US
dc.relation.journalJournal of Vacuum Science & Technology Aen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2026-02-10T15:51:32Z
dspace.orderedauthorsLi, Y; Reidy, K; Penn, A; Lee, SH; Wang, B; Ye, K; Mao, Z; Ross, FM; Jaramillo, Ren_US
dspace.date.submission2026-02-10T15:51:34Z
mit.journal.volume41en_US
mit.journal.issue2en_US
mit.licensePUBLISHER_CC
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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