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dc.contributor.authorAi, Han-Jun
dc.contributor.authorMai, Binh Khanh
dc.contributor.authorLiu, Cecilia
dc.contributor.authorLiu, Peng
dc.contributor.authorBuchwald, Stephen L
dc.date.accessioned2026-03-04T20:55:37Z
dc.date.available2026-03-04T20:55:37Z
dc.date.issued2025-10-13
dc.identifier.urihttps://hdl.handle.net/1721.1/165022
dc.description.abstractWe report a new N1,N2-diarylbenzene-1,2-diamine ligand, L6, that supports a copper catalyst capable of coupling base-sensitive aryl chlorides and amines that were previously unsuccessful substrates for Cu-catalyzed C–N coupling. A detailed structure–activity relationship study, combined with density functional theory (DFT) calculations, was used to uncover two key structural features that contribute to the efficacy of the catalyst derived from L6. First, steric repulsion caused by a methyl substituent induces a conformational change that opens up additional space for ligand deprotonation and oxidative addition. Second, the trifluoromethyl groups create electrostatic interactions between the ligand and aryl chloride substrates that facilitate oxidative addition via through-space ligand–substrate interaction.en_US
dc.language.isoen
dc.publisherAmerican Chemical Societyen_US
dc.relation.isversionof10.1021/jacs.5c10910en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourcePMCen_US
dc.titleDevelopment of a Ligand for Cu-Catalyzed Amination of Base-Sensitive (Hetero)aryl Chloridesen_US
dc.typeArticleen_US
dc.identifier.citationDevelopment of a Ligand for Cu-Catalyzed Amination of Base-Sensitive (Hetero)aryl Chlorides Han-Jun Ai, Binh Khanh Mai, Cecilia Liu, Peng Liu, and Stephen L. Buchwald. Journal of the American Chemical Society 2025 147 (42), 38275-38282.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemistryen_US
dc.relation.journalJournal of the American Chemical Societyen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2026-03-04T20:46:20Z
dspace.orderedauthorsAi, H-J; Mai, BK; Liu, C; Liu, P; Buchwald, SLen_US
dspace.date.submission2026-03-04T20:46:21Z
mit.journal.volume147en_US
mit.journal.issue42en_US
mit.licensePUBLISHER_POLICY
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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