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dc.contributor.authorZhang, Xuanyi
dc.contributor.authorPenn, Aubrey N
dc.contributor.authorWysocki, Lena
dc.contributor.authorZhang, Zhan
dc.contributor.authorvan Loosdrecht, Paul HM
dc.contributor.authorKornblum, Lior
dc.contributor.authorLeBeau, James M
dc.contributor.authorLindfors-Vrejoiu, Ionela
dc.contributor.authorKumah, Divine P
dc.date.accessioned2026-03-25T19:55:04Z
dc.date.available2026-03-25T19:55:04Z
dc.date.issued2022-05-11
dc.identifier.urihttps://hdl.handle.net/1721.1/165259
dc.description.abstractThe temperature-dependent layer-resolved structure of 3 to 44 unit cell thick SrRuO3 (SRO) films grown on Nb-doped SrTiO3 substrates is investigated using a combination of high-resolution synchrotron x-ray diffraction and high-resolution electron microscopy to understand the role that structural distortions play in suppressing ferromagnetism in ultra-thin SRO films. The oxygen octahedral tilts and rotations and Sr displacements characteristic of the bulk orthorhombic phase are found to be strongly dependent on temperature, the film thickness, and the distance away from the film–substrate interface. For thicknesses, t, above the critical thickness for ferromagnetism (t > 3 uc), the orthorhombic distortions decrease with increasing temperature above TC. Below TC, the structure of the films remains constant due to the magneto-structural coupling observed in bulk SRO. The orthorhombic distortions are found to be suppressed in the 2–3 interfacial layers due to structural coupling with the SrTiO3 substrate and correlate with the critical thickness for ferromagnetism in uncapped SRO films.en_US
dc.language.isoen
dc.publisherAIP Publishingen_US
dc.relation.isversionof10.1063/5.0087791en_US
dc.rightsCreative Commons Attributionen_US
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/en_US
dc.sourceAIP Publishingen_US
dc.titleThickness and temperature dependence of the atomic-scale structure of SrRuO3 thin filmsen_US
dc.typeArticleen_US
dc.identifier.citationXuanyi Zhang, Aubrey N. Penn, Lena Wysocki, Zhan Zhang, Paul H. M. van Loosdrecht, Lior Kornblum, James M. LeBeau, Ionela Lindfors-Vrejoiu, Divine P. Kumah; Thickness and temperature dependence of the atomic-scale structure of SrRuO3 thin films. APL Mater. 1 May 2022; 10 (5): 051107.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.relation.journalAPL Materialsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2026-03-25T19:49:37Z
dspace.orderedauthorsZhang, X; Penn, AN; Wysocki, L; Zhang, Z; van Loosdrecht, PHM; Kornblum, L; LeBeau, JM; Lindfors-Vrejoiu, I; Kumah, DPen_US
dspace.date.submission2026-03-25T19:49:39Z
mit.journal.volume10en_US
mit.journal.issue5en_US
mit.licensePUBLISHER_CC
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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