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dc.contributor.authorKim, Taeyoung
dc.contributor.authorJoishi, Chandan
dc.contributor.authorShih, Pao-Chuan
dc.contributor.authorPalacios, Tomás
dc.contributor.authorRajan, Siddharth
dc.date.accessioned2026-03-26T19:40:23Z
dc.date.available2026-03-26T19:40:23Z
dc.date.issued2022-10-26
dc.identifier.urihttps://hdl.handle.net/1721.1/165267
dc.description.abstractThis work presents a theoretical analysis of the impact of surface states on vacuum field emission currents in semiconductors. In wide and ultra-wide bandgap semiconductors such as GaN and AlGaN, low electron affinity has been proposed as a benefit for field emission into vacuum. However, in these materials, the surface Fermi level at the surface is pinned well below the conduction band, and the surface depletion barriers due to the surface Fermi level pinning can be comparable to or higher than the electron affinity. Therefore, analysis of field emission requires consideration of not only the vacuum potential barrier set by electron affinity, but also the depletion region near the semiconductor surface. In this paper, we develop analytical models to predict field emission currents with careful consideration of the impact of surface states on the energy band alignment. The results are used to provide guidelines for design of field emitters that could benefit from the low electron affinity of semiconductors such as Al(Ga)N.en_US
dc.language.isoen
dc.publisherAIP Publishingen_US
dc.relation.isversionof10.1063/5.0105657en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceAIP Publishingen_US
dc.titleThe impact of semiconductor surface states on vacuum field emissionen_US
dc.typeArticleen_US
dc.identifier.citationTaeyoung Kim, Chandan Joishi, Pao-Chuan Shih, Tomás Palacios, Siddharth Rajan; The impact of semiconductor surface states on vacuum field emission. J. Appl. Phys. 28 October 2022; 132 (16): 165701.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Microsystems Technology Laboratoriesen_US
dc.relation.journalJournal of Applied Physicsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2026-03-26T19:35:14Z
dspace.orderedauthorsKim, T; Joishi, C; Shih, P-C; Palacios, T; Rajan, Sen_US
dspace.date.submission2026-03-26T19:35:16Z
mit.journal.volume132en_US
mit.journal.issue16en_US
mit.licensePUBLISHER_POLICY
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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