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dc.contributor.authorXu, Michael
dc.contributor.authorYe, Kevin
dc.contributor.authorSadeghi, Ida
dc.contributor.authorJaramillo, R
dc.contributor.authorLeBeau, James M
dc.date.accessioned2026-04-07T14:30:20Z
dc.date.available2026-04-07T14:30:20Z
dc.date.issued2024-12-16
dc.identifier.urihttps://hdl.handle.net/1721.1/165345
dc.description.abstractUnderstanding and controlling the growth of chalcogenide perovskite thin films through interface design is important for tailoring film properties. Here, the film and interface structure of BaZr(S, Se)3 thin films grown on LaAlO3 by molecular beam epitaxy and postgrowth anion exchange is resolved using aberration-corrected scanning transmission electron microscopy. Epitaxial films are achieved from selfassembly of an interface “buffer” layer, which accommodates the large film/substrate lattice mismatch of nearly 40% for the alloy film studied here. The self-assembled buffer layer, occurring for both the as-grown sulfide and post-selenization alloy films, is shown to have rock-salt-like atomic stacking akin to a Ruddlesden–Popper phase. These results provide insights into oxide-chalcogenide heteroepitaxial film growth, illustrating a process that yields relaxed, crystalline, epitaxial chalcogenide perovskite films that support ongoing studies of optoelectronic and device properties.en_US
dc.language.isoen
dc.publisherAIP Publishingen_US
dc.relation.isversionofhttps://doi.org/10.1116/6.0004010en_US
dc.rightsCreative Commons Attributionen_US
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/en_US
dc.sourceAIP Publishingen_US
dc.titleAtomic structure of self-buffered BaZr(S, Se)3 epitaxial thin film interfacesen_US
dc.typeArticleen_US
dc.identifier.citationMichael Xu, Kevin Ye, Ida Sadeghi, R. Jaramillo, James M. LeBeau; Atomic structure of self-buffered BaZr(S, Se)3 epitaxial thin film interfaces. J. Vac. Sci. Technol. A 1 November 2024; 42 (6): 063207.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.relation.journalJournal of Vacuum Science & Technology Aen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2026-04-07T14:25:44Z
dspace.orderedauthorsXu, M; Ye, K; Sadeghi, I; Jaramillo, R; LeBeau, JMen_US
dspace.date.submission2026-04-07T14:25:46Z
mit.journal.volume42en_US
mit.journal.issue6en_US
mit.licensePUBLISHER_CC
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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