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dc.contributor.authorJeong, Changwook
dc.contributor.authorAntoniadis, Dimitri A.
dc.contributor.authorLundstrom, Mark S.
dc.date.accessioned2010-03-09T19:55:11Z
dc.date.available2010-03-09T19:55:11Z
dc.date.issued2009-10
dc.date.submitted2009-08
dc.identifier.issn0018-9383
dc.identifier.urihttp://hdl.handle.net/1721.1/52435
dc.description.abstractThe DC current-voltage characteristics of an n-channel silicon MOSFET with an effective gate length of about 60 nm are analyzed and interpreted in terms of scattering theory. The experimental results are found to be consistent with the predictions of scattering theory - the drain current is closer to the ballistic limit under high drain bias than under low drain bias, and the on-current in strong inversion is limited by a small portion of the channel near the source. The question of how the low- and high- V DS drain currents are related to the near-equilibrium, long-channel mobility is also addressed. In the process of this analysis, theoretical and experimental uncertainties that make it difficult to extract numerically precise values of the scattering parameters are identified.en
dc.language.isoen_US
dc.publisherInstitute of Electrical and Electronics Engineersen
dc.relation.isversionofhttp://dx.doi.org/10.1109/ted.2009.2030844en
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en
dc.sourceIEEEen
dc.subjectmobilityen
dc.subjectmean free pathen
dc.subjectMOSFETsen
dc.subjectBackscattering coefficienten
dc.titleOn Backscattering and Mobility in Nanoscale Silicon MOSFETsen
dc.typeArticleen
dc.identifier.citationChangwook Jeong, D.A. Antoniadis, and M.S. Lundstrom. “On Backscattering and Mobility in Nanoscale Silicon MOSFETs.” Electron Devices, IEEE Transactions on 56.11 (2009): 2762-2769. © 2009 IEEEen
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentMassachusetts Institute of Technology. Microsystems Technology Laboratoriesen_US
dc.contributor.approverAntoniadis, Dimitri A.
dc.contributor.mitauthorAntoniadis, Dimitri A.
dc.relation.journalIEEE Transactions on Electron Devicesen
dc.eprint.versionFinal published versionen
dc.type.urihttp://purl.org/eprint/type/JournalArticleen
eprint.statushttp://purl.org/eprint/status/PeerRevieweden
dspace.orderedauthorsJeong, Changwook; Antoniadis, Dimitri A.; Lundstrom, Mark S.en
dc.identifier.orcidhttps://orcid.org/0000-0002-4836-6525
mit.licensePUBLISHER_POLICYen
mit.metadata.statusComplete


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