PAG segregation during exposure affecting innate material roughness

Author(s)
Pottebaum, Indira; Cann, Susan G.; Cabral, Alberto; Astolfi, David K.; Fedynyshyn, Theodore H.; ... Show more
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Abstract
We have developed an improved AFM-based technique to measure intrinsic material roughness (IMR) after base development. We have investigated the contribution of different polymeric PAGs to IMR. These polymeric PAGs include copolymers of several styrenic PAGs with hydroxystyrene. The IMR of these polymer-bound PAGs is reduced relative to that of their nonpolymeric counterparts with DUV exposure. Theses results represent further evidence for PAG segregation during the bake steps as being responsible for increased IMR in exposed resists, presumably by increasing the dissolution rate inhomogeneity on a nano-scale level. The work also shows that the effects of PAG segregation can be mitigated by employing polymer-bound PAGs. 2
Date issued
2009-04
URI
http://hdl.handle.net/1721.1/52663
Department
Lincoln Laboratory
Journal
Proceedings of SPIE
Publisher
The International Society for Optical Engineering
Citation
Fedynyshyn, Theodore H. et al. “PAG segregation during exposure affecting innate material roughness.” Advances in Resist Materials and Processing Technology XXVI. Ed. Clifford L. Henderson. San Jose, CA, USA: SPIE, 2009. 727349-11. © 2009 SPIE--The International Society for Optical Engineering
Version: Final published version
ISSN
0277-786X
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