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dc.contributor.authorRaghunathan, Vivek
dc.contributor.authorYe, Winnie N.
dc.contributor.authorHu, Juejun
dc.contributor.authorIzuhara, Tomoyuki
dc.contributor.authorMichel, Jurgen
dc.contributor.authorKimerling, Lionel C.
dc.date.accessioned2010-09-02T14:28:56Z
dc.date.available2010-09-02T14:28:56Z
dc.date.issued2010-08
dc.date.submitted2010-07
dc.identifier.issn1094-4087
dc.identifier.urihttp://hdl.handle.net/1721.1/58117
dc.description.abstractWe report the design criteria and performance of Si ring resonators for passive athermal applications in wavelength division multiplexing (WDM). The waveguide design rules address i) positivenegative thermo-optic (TO) composite structures, ii) resonant wavelength dependent geometry to achieve constant confinement factor ( Γ ), and iii) observation of small residual second order effects. We develop exact design requirements for a temperature dependent resonant wavelength shift (TDWS) of 0 pm/K and present prototype TDWS performance of 0.5pm/K. We evaluate the materials selection tradeoffs between high-index contrast (HIC) and low-index contrast (LIC) systems and show, remarkably, that FSR and footprint become comparable under the constraint of athermal design.en_US
dc.description.sponsorshipUnited States. Defense Advanced Research Projects Agency . Athermal Photonic Circuits programen_US
dc.language.isoen_US
dc.publisherOptical Society of Americaen_US
dc.relation.isversionofhttp://dx.doi.org/10.1364/OE.18.017631en_US
dc.rightsAttribution-Noncommercial-Share Alike 3.0 Unporteden_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/3.0/en_US
dc.sourceVivek Raghunathanen_US
dc.subjectIntegrated Opticsen_US
dc.titleAthermal Operation of Silicon Waveguides: Spectral, Second Order and Footprint Dependenciesen_US
dc.typeArticleen_US
dc.identifier.citationVivek Raghunathan, Winnie N. Ye, Juejun Hu, Tomoyuki Izuhara, Jurgen Michel, and Lionel Kimerling, "Athermal operation of Silicon waveguides: spectral, second order and footprint dependencies," Opt. Express 18, 17631-17639 (2010)en_US
dc.contributor.departmentMassachusetts Institute of Technology. Materials Processing Centeren_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Microphotonics Centeren_US
dc.contributor.approverRaghunathan, Vivek
dc.contributor.mitauthorRaghunathan, Vivek
dc.contributor.mitauthorHu, Juejun
dc.contributor.mitauthorMichel, Jurgen
dc.contributor.mitauthorKimerling, Lionel C.
dc.relation.journalOptics Expressen_US
dc.eprint.versionAuthor's final manuscript
dc.type.urihttp://purl.org/eprint/type/SubmittedJournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsRaghunathan, Vivek; Ye, Winnie N.; Hu, Juejun; Izuhara, Tomoyuki; Michel, Jurgen; Kimerling, Lionelen
dc.identifier.orcidhttps://orcid.org/0000-0002-7233-3918
dc.identifier.orcidhttps://orcid.org/0000-0002-3913-6189
mit.licenseOPEN_ACCESS_POLICYen_US
mit.metadata.statusComplete


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