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Suppression of carrier leakage in 4.8 [micrometre] - Emitting quantum cascade lasers

Author(s)
Kumar, Sushil; Botez, Dan; Shin, J. C.; Mawst, Luke J.; Vurgaftman, I.; Meyer, Jerry R.; ... Show more Show less
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Alternative title
Suppression of carrier leakage in 4.8 µm - Emitting quantum cascade lasers
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Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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Abstract
In this work we show that by using both deep quantum wells and tall barriers in the active regions of quantum cascade (QC)-laser structures and by tapering the conduction-band edge of both injector an extractor regions one can significantly reduce the leakage of the injected carriers. Threshold-current, Jth and differential-quantum efficiency, etad characteristic temperatures, T0 and T1, values as high as 278 K and 285 K are obtained to 90 °C heatsink temperature, which means that Jth and etad vary ~ 2.5 slower over the 20-90 °C temperature range than in conventional QC devices. Modified equations for Jth and etad are derived. In particular, the equation for etad includes, for the first time, its dependence on heatsink temperature. A model for the thermal excitation of injected carriers from the upper lasing level to upper active-region energy states from where they relax to lower active-region energy states or get scattered to the upper Gamma miniband is employed to estimate carrier leakage. Good agreement with experiment is obtained for both conventional QC lasers and deep-well (DW)-QC lasers.
Date issued
2010-02
URI
http://hdl.handle.net/1721.1/58474
Department
Massachusetts Institute of Technology. Research Laboratory of Electronics
Journal
Novel In-Plane Semiconductor Lasers IX
Publisher
Society of Photo-optical Instrumentation Engineers
Citation
Botez, D. et al. “Suppression of carrier leakage in 4.8 [micrometre] - emitting quantum cascade lasers.” Novel In-Plane Semiconductor Lasers IX. Ed. Alexey A. Belyanin & Peter M. Smowton. San Francisco, California, USA: SPIE, 2010. 76160N-9. ©2010 SPIE--The International Society for Optical Engineering.
Version: Final published version
ISSN
0277-786X

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