| dc.contributor.author | Srisungsitthisunti, Pornsak | |
| dc.contributor.author | Tansarawiput, Chookiat | |
| dc.contributor.author | Zhang, Huaichen | |
| dc.contributor.author | Qi, Minghao | |
| dc.contributor.author | Xu, Xianfan | |
| dc.contributor.author | Moon, Euclid Eberle | |
| dc.date.accessioned | 2011-02-15T13:41:47Z | |
| dc.date.available | 2011-02-15T13:41:47Z | |
| dc.date.issued | 2010-08 | |
| dc.date.submitted | 2010-08 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | http://hdl.handle.net/1721.1/60945 | |
| dc.description.abstract | We describe a method of detecting nanometer-level gap and tip/tilt alignment between a focusing zone plate mask and a silicon substrate using interferometric-spatial-phase-imaging (ISPI). The zone plate mask is used to generate submicrometer focused light spot to induce silicon nanowire growth in a CVD process. ISPI makes use of diffracting fringes from gratings and checkerboards fabricated on the mask to determine the correct gapping distance for the focusing zone plates. The method is capable of detecting alignment inside a gas-flow chamber with variable pressure. | en_US |
| dc.description.sponsorship | United States. Defense Advanced Research Projects Agency (DARPA) (Grant No. N66001-08-1-2037) | en_US |
| dc.language.iso | en_US | |
| dc.publisher | SPIE | en_US |
| dc.relation.isversionof | http://dx.doi.org/10.1117/12.860581 | en_US |
| dc.rights | Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. | en_US |
| dc.source | SPIE | en_US |
| dc.title | Nanometer-level alignment using interferometric-spatial-phase-imaging (ISPI) during silicon nanowire growth | en_US |
| dc.type | Article | en_US |
| dc.identifier.citation | Pornsak Srisungsitthisunti, Euclid E. Moon, Chookiat Tansarawiput, Huaichen Zhang, Minghao Qi and Xianfan Xu, "Nanometer-level alignment using interferometric-spatial-phase-imaging (ISPI) during silicon nanowire growth", Proc. SPIE 7767, 776707 (2010); doi:10.1117/12.860581 © 2010 COPYRIGHT SPIE | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Research Laboratory of Electronics | en_US |
| dc.contributor.approver | Moon, Euclid Eberle | |
| dc.contributor.mitauthor | Moon, Euclid Eberle | |
| dc.relation.journal | Proceedings of SPIE--the International Society for Optical Engineering | en_US |
| dc.eprint.version | Final published version | en_US |
| dc.type.uri | http://purl.org/eprint/type/ConferencePaper | en_US |
| dspace.orderedauthors | Srisungsitthisunti, Pornsak; Moon, Euclid E.; Tansarawiput, Chookiat; Zhang, Huaichen; Qi, Minghao; Xu, Xianfan | en |
| mit.license | PUBLISHER_POLICY | en_US |
| mit.metadata.status | Complete | |
