Regular pattern formation through the retraction and pinch-off of edges during solid-state dewetting of patterned single crystal films
Author(s)
Ye, Jongpil; Thompson, Carl V.
DownloadYe-2010-Regular pattern form.pdf (380.7Kb)
PUBLISHER_POLICY
Publisher Policy
Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
Terms of use
Metadata
Show full item recordAbstract
We report the formation of regular patterns of metal lines via solid-state dewetting of lithographically patterned single-crystal Ni(110) films with square and cross shapes. During the solid-state dewetting, valleys develop behind retracting edges and eventually lead to pinch-off and formation of lines. Mass accumulation at convex pattern corners also leads to formation of lines. We show that the size of large-scale patterns and surface-energy anisotropy affect the smaller-scale dewetted structures in a deterministic way.
Date issued
2010-11Department
Massachusetts Institute of Technology. Department of Materials Science and EngineeringJournal
Physical Review B
Publisher
American Physical Society
Citation
Ye, Jongpil, and Carl V. Thompson. “Regular Pattern Formation Through the Retraction and Pinch-off of Edges During Solid-state Dewetting of Patterned Single Crystal Films.” Physical Review B 82.19 (2010) : 193408. © 2010 The American Physical Society
Version: Final published version
ISSN
1098-0121
1550-235X