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dc.contributor.authorHorstmeyer, Roarke William
dc.contributor.authorOh, Se Baek
dc.contributor.authorRaskar, Ramesh
dc.date.accessioned2011-10-11T17:18:06Z
dc.date.available2011-10-11T17:18:06Z
dc.date.issued2010-10
dc.date.submitted2010-09
dc.identifier.issn1094-4087
dc.identifier.urihttp://hdl.handle.net/1721.1/66204
dc.description.abstractWe present an iterative camera aperture design procedure, which determines an optimal mask pattern based on a sparse set of desired intensity distributions at different focal depths. This iterative method uses the ambiguity function as a tool to shape the camera’s response to defocus, and shares conceptual similarities with phase retrieval procedures. An analysis of algorithm convergence is presented, and experimental examples are shown to demonstrate the flexibility of the design process. This algorithm potentially ties together previous disjointed PSF design approaches under a common framework, and offers new insights for the creation of future application-specific imaging systems.en_US
dc.description.sponsorshipNational Defense Science and Engineering Graduate Fellowshipen_US
dc.description.sponsorshipUnited States. Air Force Office of Scientific Researchen_US
dc.description.sponsorshipAlfred P. Sloan Foundationen_US
dc.language.isoen_US
dc.publisherOptical Society of Americaen_US
dc.relation.isversionofhttp://dx.doi.org/10.1364/OE.18.022545en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceOptical Societyen_US
dc.titleIterative aperture mask design in phase space using a rank constrainten_US
dc.typeArticleen_US
dc.identifier.citationHorstmeyer, Roarke, Se Baek Oh, and Ramesh Raskar. “Iterative aperture mask design in phase space using a rank constraint.” Optics Express 18 (21) (2010): 22545-22555. © 2010 OSA (Optical Society of America)en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Media Laboratoryen_US
dc.contributor.departmentProgram in Media Arts and Sciences (Massachusetts Institute of Technology)en_US
dc.contributor.approverRaskar, Ramesh
dc.contributor.mitauthorHorstmeyer, Roarke William
dc.contributor.mitauthorOh, Se Baek
dc.contributor.mitauthorRaskar, Ramesh
dc.relation.journalOptics Expressen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsHorstmeyer, Roarke; Oh, Se Baek; Raskar, Rameshen
dc.identifier.orcidhttps://orcid.org/0000-0002-2480-9141
dc.identifier.orcidhttps://orcid.org/0000-0002-3254-3224
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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