dc.contributor.author | Horstmeyer, Roarke William | |
dc.contributor.author | Oh, Se Baek | |
dc.contributor.author | Raskar, Ramesh | |
dc.date.accessioned | 2011-10-11T17:18:06Z | |
dc.date.available | 2011-10-11T17:18:06Z | |
dc.date.issued | 2010-10 | |
dc.date.submitted | 2010-09 | |
dc.identifier.issn | 1094-4087 | |
dc.identifier.uri | http://hdl.handle.net/1721.1/66204 | |
dc.description.abstract | We present an iterative camera aperture design procedure, which determines an optimal mask pattern based on a sparse set of desired intensity distributions at different focal depths. This iterative method uses the ambiguity function as a tool to shape the camera’s response to defocus, and shares conceptual similarities with phase retrieval procedures. An analysis of algorithm convergence is presented, and experimental examples are shown to demonstrate the flexibility of the design process. This algorithm potentially ties together previous disjointed PSF design approaches under a common framework, and offers new insights for the creation of future application-specific imaging systems. | en_US |
dc.description.sponsorship | National Defense Science and Engineering Graduate Fellowship | en_US |
dc.description.sponsorship | United States. Air Force Office of Scientific Research | en_US |
dc.description.sponsorship | Alfred P. Sloan Foundation | en_US |
dc.language.iso | en_US | |
dc.publisher | Optical Society of America | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1364/OE.18.022545 | en_US |
dc.rights | Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. | en_US |
dc.source | Optical Society | en_US |
dc.title | Iterative aperture mask design in phase space using a rank constraint | en_US |
dc.type | Article | en_US |
dc.identifier.citation | Horstmeyer, Roarke, Se Baek Oh, and Ramesh Raskar. “Iterative aperture mask design in phase space using a rank constraint.” Optics Express 18 (21) (2010): 22545-22555. © 2010 OSA (Optical Society of America) | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Mechanical Engineering | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Media Laboratory | en_US |
dc.contributor.department | Program in Media Arts and Sciences (Massachusetts Institute of Technology) | en_US |
dc.contributor.approver | Raskar, Ramesh | |
dc.contributor.mitauthor | Horstmeyer, Roarke William | |
dc.contributor.mitauthor | Oh, Se Baek | |
dc.contributor.mitauthor | Raskar, Ramesh | |
dc.relation.journal | Optics Express | en_US |
dc.eprint.version | Final published version | en_US |
dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
dspace.orderedauthors | Horstmeyer, Roarke; Oh, Se Baek; Raskar, Ramesh | en |
dc.identifier.orcid | https://orcid.org/0000-0002-2480-9141 | |
dc.identifier.orcid | https://orcid.org/0000-0002-3254-3224 | |
mit.license | PUBLISHER_POLICY | en_US |
mit.metadata.status | Complete | |