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dc.contributor.authorLin, Xi
dc.contributor.authorHu, Jingshi
dc.contributor.authorLai, Andrew Pan
dc.contributor.authorZhang, Zhenning
dc.contributor.authorMacLean, Kenneth
dc.contributor.authorDillard, Colin R.
dc.contributor.authorXie, Ya-Hong
dc.contributor.authorKastner, Marc
dc.date.accessioned2012-06-04T18:03:06Z
dc.date.available2012-06-04T18:03:06Z
dc.date.issued2011-07
dc.date.submitted2011-04
dc.identifier.issn0021-8979
dc.identifier.issn1089-7550
dc.identifier.urihttp://hdl.handle.net/1721.1/71015
dc.description.abstractQuantum dots in Si/SiGe heterostructures are expected to have relatively long electron spin decoherence times, because of the low density of nuclear spins and the weak coupling between nuclear and electron spins. We provide experimental evidence suggesting that electron motion in a conductive layer parallel to the two-dimensional electron gas, possibly resulting from the donors used to dope the Si quantum well, is responsible for the well-known difficulty in achieving well-controlled dots in this system. Charge motion in the conductive layer can cause depletion on large length scales, making electron confinement in the dot impossible, and can give rise to noise that can overwhelm the single-electron charging signal. Results of capacitance versus gate bias measurements to characterize this conductive layer are presented.en_US
dc.description.sponsorshipNational Science Foundation (U.S.) ((PHY-0117795)en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (DMR-0701386)en_US
dc.language.isoen_US
dc.publisherAmerican Institute of Physics (AIP)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.3610524en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alike 3.0en_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/3.0/en_US
dc.sourceProf. Kastner via Mat Willmotten_US
dc.titleThe effect of surface conductance on lateral gated quantum devices in Si/SiGe heterostructuresen_US
dc.typeArticleen_US
dc.identifier.citationLin, Xi et al. “The effect of surface conductance on lateral gated quantum devices in Si/SiGe heterostructures.” Journal of Applied Physics 110.2 (2011): 023712.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Physicsen_US
dc.contributor.approverKastner, Marc
dc.contributor.mitauthorLin, Xi
dc.contributor.mitauthorHu, Jingshi
dc.contributor.mitauthorLai, Andrew Pan
dc.contributor.mitauthorMacLean, Kenneth
dc.contributor.mitauthorDillard, Colin R.
dc.contributor.mitauthorKastner, Marc A.
dc.relation.journalJournal of Applied Physicsen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsLin, Xi; Hu, Jingshi; Lai, Andrew P.; Zhang, Zhenning; MacLean, Kenneth; Dillard, Colin; Xie, Ya-Hong; Kastner, Marc A.en
dc.identifier.orcidhttps://orcid.org/0000-0001-7641-5438
dspace.mitauthor.errortrue
mit.licenseOPEN_ACCESS_POLICYen_US
mit.metadata.statusComplete


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