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dc.contributor.authorHan, Yong
dc.contributor.authorUnal, Baris
dc.contributor.authorEvans, J. W.
dc.date.accessioned2012-07-18T20:08:23Z
dc.date.available2012-07-18T20:08:23Z
dc.date.issued2012-05
dc.date.submitted2012-01
dc.identifier.issn0031-9007
dc.identifier.issn1079-7114
dc.identifier.urihttp://hdl.handle.net/1721.1/71697
dc.description.abstractThe formation of a new type of ordered 2D Ni3Al overlayer by low-temperature codeposition on NiAl(110) is demonstrated by kinetic Monte Carlo simulation of a multisite atomistic lattice-gas model with a precise treatment of surface diffusion kinetics. Simultaneous codeposition with 3∶1 Ni∶Al yields poor ordering at 300 K but well-ordered structures by ~500  K. Sequential codeposition of Nien_US
dc.description.sponsorshipNational Science Foundation (U.S.) (Grant No. CHE- 1111500)en_US
dc.description.sponsorshipUnited States. Dept. of Energy (Contract No. DE-AC02-07CH11358)en_US
dc.language.isoen_US
dc.publisherAmerican Physical Societyen_US
dc.relation.isversionofhttp://dx.doi.org/10.1103/PhysRevLett.108.216102en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceAPSen_US
dc.titleFormation of a Novel Ordered Ni3Al Surface Structure by Codeposition on NiAl(110)en_US
dc.typeArticleen_US
dc.identifier.citationHan, Yong, Barış Ünal, and J. Evans. “Formation of a Novel Ordered Ni_{3}Al Surface Structure by Codeposition on NiAl(110).” Physical Review Letters 108.21 (2012). © 2012 American Physical Societyen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemical Engineeringen_US
dc.contributor.approverUnal, Baris
dc.contributor.mitauthorUnal, Baris
dc.relation.journalPhysical Review Lettersen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsHan, Yong; Ünal, Barış; Evans, J.en
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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