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A novel white-light scanning interferometer for absolute nano-scale gap thickness measurement

Author(s)
Xu, Zhiguang; Youcef-Toumi, Kamal; Yoon, Soon Fatt
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Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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Abstract
This paper presents a special configuration of white-light scanning interferometer, in which the measured gap is not located in any interference arm of the interferometer, but acts as an amplitude-and-phase modulator of the light source. Compared to the common white-light interferometer, the approach avoids the influence of the chromatic dispersion of the planar plates on the gap thickness measurement. It possesses a large measurement range of from several hundreds of nanometers to tens of microns as well as a high resolution of 0.1 nm, but does not employ any expensive equipment like spectrometer or monochromator. These advantages make our approach quite competent for the practical applications.
Date issued
2009-11
URI
http://hdl.handle.net/1721.1/71871
Department
Massachusetts Institute of Technology. Department of Mechanical Engineering
Journal
2009 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Citation
Xu, Zhiguang et al. “A Novel White-light Scanning Interferometer for Absolute Nano-scale Gap Thickness Measurement.” IEEE, 2009. 97–98. © Copyright 2009 IEEE
Version: Final published version
ISBN
978-1-4244-2382-8

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