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dc.contributor.authorLow, Guang Hao
dc.contributor.authorLachenmyer, Nathan S.
dc.contributor.authorGe, Yufei
dc.contributor.authorHerskind, Peter F.
dc.contributor.authorChuang, Isaac L.
dc.contributor.authorWang, Shannon X.
dc.date.accessioned2012-08-01T20:07:10Z
dc.date.available2012-08-01T20:07:10Z
dc.date.issued2011-11
dc.date.submitted2011-07
dc.identifier.issn0021-8979
dc.identifier.issn1089-7550
dc.identifier.urihttp://hdl.handle.net/1721.1/71950
dc.description.abstractElectrical charging of metal surfaces due to photoelectric generation of carriers is of concern in trapped ion quantum computation systems, due to the high sensitivity of the ions’ motional quantum states to deformation of the trapping potential. The charging induced by typical laser frequencies involved in Doppler cooling and quantum control is studied here, with microfabricated surface-electrode traps made of aluminum, copper, and gold, operated at 6 K with a single Sr[superscript +] ion trapped 100 μm above the trap surface. The lasers used are at 370, 405, 460, and 674 nm, and the typical photon flux at the trap is 10[superscript 14] photons/cm[superscript 2]/sec. Charging is detected by monitoring the ion’s micromotion signal, which is related to the number of charges created on the trap. A wavelength and material dependence of the charging behavior is observed: Lasers at lower wavelengths cause more charging, and aluminum exhibits more charging than copper or gold. We describe the charging dynamic based on a rate-equation approach.en_US
dc.description.sponsorshipNational Science Foundation (U.S.). Center for Ultracold Atomsen_US
dc.description.sponsorshipUnited States. Intelligence Advanced Research Projects Activity. (COMMIT program)en_US
dc.description.sponsorshipUnited States. Intelligence Advanced Research Projects Activity. (SQIP project)en_US
dc.language.isoen_US
dc.publisherAmerican Institute of Physics (AIP)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.3662118en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceMIT web domainen_US
dc.titleLaser-induced charging of microfabricated ion trapsen_US
dc.typeArticleen_US
dc.identifier.citationWang, Shannon X. et al. “Laser-induced Charging of Microfabricated Ion Traps.” Journal of Applied Physics 110.10 (2011): 104901. © 2011 American Institute of Physicsen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Physicsen_US
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronicsen_US
dc.contributor.departmentMIT-Harvard Center for Ultracold Atomsen_US
dc.contributor.approverChuang, Isaac
dc.contributor.mitauthorWang, Shannon Xuanyue
dc.contributor.mitauthorLow, Guang Hao
dc.contributor.mitauthorLachenmyer, Nathan S.
dc.contributor.mitauthorGe, Yufei
dc.contributor.mitauthorHerskind, Peter F.
dc.contributor.mitauthorChuang, Isaac L.
dc.relation.journalJournal of Applied Physicsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsWang, Shannon X.; Hao Low, Guang; Lachenmyer, Nathan S.; Ge, Yufei; Herskind, Peter F.; Chuang, Isaac L.en
dc.identifier.orcidhttps://orcid.org/0000-0001-7296-523X
dc.identifier.orcidhttps://orcid.org/0000-0002-6211-982X
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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