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dc.contributor.authorMarathe, Radhika A.
dc.contributor.authorWang, Wentao
dc.contributor.authorWeinstein, Dana
dc.date.accessioned2012-10-03T19:11:01Z
dc.date.available2012-10-03T19:11:01Z
dc.date.issued2012-03
dc.date.submitted2012-01
dc.identifier.isbn978-1-4673-0324-8
dc.identifier.issn1084-6999
dc.identifier.urihttp://hdl.handle.net/1721.1/73577
dc.description.abstractThis work presents the first unreleased Silicon resonators fabricated at the transistor level of a standard CMOS process, and realized without any release steps or packaging. These unreleased bulk acoustic resonators are driven capacitively using the thin gate dielectric of the CMOS process, and actively sensed with a Field Effect Transistor (FET) incorporated into the resonant body. FET sensing using the high f[subscript T], high performance transistors in CMOS amplifies the mechanical signal before the presence of parasitics. This enables RF-MEMS resonators at orders of magnitude higher frequencies than possible with passive devices. First generation CMOS-MEMS Si resonators with Acoustic Bragg Reflectors are demonstrated at 11.1 GHz with Q~17 and a total footprint of 5μm × 3μm using IBM's 32nm SOI technology.en_US
dc.description.sponsorshipUnited States. Defense Advanced Research Projects Agency. Leading Edge Access Programen_US
dc.description.sponsorshipUnited States. National Security Agency. Trusted Access Program Officeen_US
dc.description.sponsorshipInternational Business Machines Corporationen_US
dc.language.isoen_US
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1109/MEMSYS.2012.6170289en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alike 3.0en_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/3.0/en_US
dc.sourceMIT web domainen_US
dc.titleSI-based unreleased hybrid MEMS-CMOS resonators in 32nm technologyen_US
dc.typeArticleen_US
dc.identifier.citationMarathe, Radhika, Wentao Wang, and Dana Weinstein. “Si-based Unreleased Hybrid MEMS-CMOS Resonators in 32nm Technology.” IEEE 25th International Conference on Micro Electro Mechanical Systems (MEMS), 2012. 729–732.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.mitauthorMarathe, Radhika A.
dc.contributor.mitauthorWang, Wentao
dc.contributor.mitauthorWeinstein, Dana
dc.relation.journalProceedings of the IEEE 25th International Conference on Micro Electro Mechanical Systems (MEMS), 2012en_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/ConferencePaperen_US
dspace.orderedauthorsMarathe, Radhika; Wang, Wentao; Weinstein, Danaen
mit.licenseOPEN_ACCESS_POLICYen_US
mit.metadata.statusComplete


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