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dc.contributor.authorKim, Tae-Woo
dc.contributor.authordel Alamo, Jesus A.
dc.date.accessioned2012-10-10T17:51:14Z
dc.date.available2012-10-10T17:51:14Z
dc.date.issued2011-08
dc.date.submitted2011-05
dc.identifier.isbn978-3-8007-3356-9
dc.identifier.isbn978-1-4577-1753-6
dc.identifier.urihttp://hdl.handle.net/1721.1/73857
dc.description.abstractWe have experimentally extracted the virtual-source electron injection velocity in InAs HEMTs with a 5 nm thick channel. For long gate lengths, these devices exhibit noticeably worse injection velocity than thicker channel devices of a similar design. However, for very short gate lengths, as the devices approach the ballistic regime, the extracted injection velocity becomes rather independent of channel thickness. From these results, we can conclude that InAs-based QW-FETs with very thin channels have the potential of scaling to very short dimensions.en_US
dc.description.sponsorshipIntel Corporationen_US
dc.description.sponsorshipSemiconductor Research Corporation. Center for Materials, Structures and Devicesen_US
dc.language.isoen_US
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en_US
dc.relation.isversionofhttp://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=5978395en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alike 3.0en_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/3.0/en_US
dc.sourceMIT web domainen_US
dc.titleInjection velocity in thin-channel InAs HEMTsen_US
dc.typeArticleen_US
dc.identifier.citationTae-Woo Kim, Jesús A. del Alamo. "2011 and 23rd International Conference on Indium Phosphide and Related Materials Compound Semiconductor Week (CSW/IPRM)" IEEE, 2011.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentMassachusetts Institute of Technology. Microsystems Technology Laboratoriesen_US
dc.contributor.mitauthorKim, Tae-Woo
dc.contributor.mitauthordel Alamo, Jesus A.
dc.relation.journalProceedings on the 2011 and 23rd International Conference on Indium Phosphide and Related Materials Compound Semiconductor Week (CSW/IPRM)en_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/ConferencePaperen_US
mit.licenseOPEN_ACCESS_POLICYen_US
mit.metadata.statusComplete


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