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dc.contributor.authorFenning, David P.
dc.contributor.authorHofstetter, Jasmin
dc.contributor.authorBertoni, Mariana I.
dc.contributor.authorHudelson, S.
dc.contributor.authorRinio, M.
dc.contributor.authorLelievre, J. F.
dc.contributor.authorLai, Barry
dc.contributor.authordel Canizo, C.
dc.contributor.authorBuonassisi, Tonio
dc.date.accessioned2013-03-27T18:53:00Z
dc.date.available2013-03-27T18:53:00Z
dc.date.issued2011-04
dc.date.submitted2010-10
dc.identifier.issn0003-6951
dc.identifier.issn1077-3118
dc.identifier.urihttp://hdl.handle.net/1721.1/78005
dc.description.abstractThe evolution during silicon solar cell processing of performance-limiting iron impurities is investigated with synchrotron-based x-ray fluorescence microscopy. We find that during industrial phosphorus diffusion, bulk precipitate dissolution is incomplete in wafers with high metal content, specifically ingot border material. Postdiffusion low-temperature annealing is not found to alter appreciably the size or spatial distribution of FeSi[subscript 2] precipitates, although cell efficiency improves due to a decrease in iron interstitial concentration. Gettering simulations successfully model experiment results and suggest the efficacy of high- and low-temperature processing to reduce both precipitated and interstitial iron concentrations, respectively.en_US
dc.description.sponsorshipUnited States. Dept. of Energy (Contract DE-FG36-09GO1900)en_US
dc.description.sponsorshipSpanish Ministry of Science and Innovation (Thincells Project TEC2008-06798-C03-02)en_US
dc.language.isoen_US
dc.publisherAmerican Institute of Physics (AIP)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.3575583en_US
dc.titleIron distribution in silicon after solar cell processing: Synchrotron analysis and predictive modelingen_US
dc.typeArticleen_US
dc.identifier.citationFenning, D. P. et al. “Iron Distribution in Silicon After Solar Cell Processing: Synchrotron Analysis and Predictive Modeling.” Applied Physics Letters 98.16 (2011): 162103. ©2011 American Institute of Physicsen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.mitauthorFenning, David P.
dc.contributor.mitauthorBertoni, Mariana I.
dc.contributor.mitauthorHudelson, S.
dc.contributor.mitauthorBuonassisi, Tonio
dc.relation.journalApplied Physics Lettersen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsFenning, D. P.; Hofstetter, J.; Bertoni, M. I.; Hudelson, S.; Rinio, M.; Lelièvre, J. F.; Lai, B.; del Cañizo, C.; Buonassisi, T.en
dc.identifier.orcidhttps://orcid.org/0000-0002-4609-9312
dc.identifier.orcidhttps://orcid.org/0000-0001-8345-4937
mit.licenseOPEN_ACCESS_POLICYen_US
mit.metadata.statusComplete


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