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dc.contributor.authorWinkler, Mark Thomas
dc.contributor.authorNewman, Bonna Kay
dc.contributor.authorBuonassisi, Tonio
dc.contributor.authorWilks, R. G.
dc.contributor.authorWeinhardt, L.
dc.contributor.authorRecht, D.
dc.contributor.authorSaid, A. J.
dc.contributor.authorZhang, Y.
dc.contributor.authorBlum, M.
dc.contributor.authorKrause, S.
dc.contributor.authorYang, W. L.
dc.contributor.authorHeske, C.
dc.contributor.authorAziz, Michael J.
dc.contributor.authorBar, M.
dc.contributor.authorSullivan, Joseph Timothy, Ph. D. Massachusetts Institute of Technology
dc.date.accessioned2013-03-28T16:11:20Z
dc.date.available2013-03-28T16:11:20Z
dc.date.issued2011-10
dc.date.submitted2011-07
dc.identifier.issn0003-6951
dc.identifier.issn1077-3118
dc.identifier.urihttp://hdl.handle.net/1721.1/78016
dc.description.abstractWe apply soft x-ray emission spectroscopy (XES) to measure the electronic structure of crystalline silicon supersaturated with sulfur (up to 0.7 at. %), a candidate intermediate-band solar cell material. Si L[subscript 2,3] emission features are observed above the conventional Si valence band maximum, with intensity scaling linearly with S concentration. The lineshape of the S-induced features change across the insulator-to-metal transition, indicating a significant modification of the local electronic structure concurrent with the change in macroscopic electronic behavior. The relationship between the Si L[subscript 2,3] XES spectral features and the anomalously high sub-band gap infrared absorption is discussed.en_US
dc.description.sponsorshipArmy Armament Research, Development, and Engineering Center (U.S.) (Contract W15QKN-07-P-0092)en_US
dc.description.sponsorshipUnited States. Army Research Office (Grant W911NF-09-1-0470)en_US
dc.language.isoen_US
dc.publisherAmerican Institute of Physics (AIP)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.3643050en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceMIT web domainen_US
dc.titleSoft x-ray emission spectroscopy studies of the electronic structure of silicon supersaturated with sulfuren_US
dc.typeArticleen_US
dc.identifier.citationSullivan, J. T. et al. “Soft X-ray Emission Spectroscopy Studies of the Electronic Structure of Silicon Supersaturated with Sulfur.” Applied Physics Letters 99.14 (2011): 142102. ©2011 American Institute of Physicsen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Laboratory for Manufacturing and Productivityen_US
dc.contributor.mitauthorSullivan, Joseph Timothy
dc.contributor.mitauthorWinkler, Mark Thomas
dc.contributor.mitauthorNewman, Bonna Kay
dc.contributor.mitauthorBuonassisi, Tonio
dc.relation.journalApplied Physics Lettersen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsSullivan, J. T.; Wilks, R. G.; Winkler, M. T.; Weinhardt, L.; Recht, D.; Said, A. J.; Newman, B. K.; Zhang, Y.; Blum, M.; Krause, S.; Yang, W. L.; Heske, C.; Aziz, M. J.; Bär, M.; Buonassisi, T.en
dc.identifier.orcidhttps://orcid.org/0000-0001-8345-4937
dspace.mitauthor.errortrue
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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