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dc.contributor.authorBaloch, Kamal H.
dc.contributor.authorJohnston-Peck, Aaron C.
dc.contributor.authorKisslinger, Kim
dc.contributor.authorStach, Eric A.
dc.contributor.authorGradecak, Silvija
dc.date.accessioned2013-07-22T15:18:45Z
dc.date.available2013-07-22T15:18:45Z
dc.date.issued2013-05
dc.date.submitted2013-04
dc.identifier.issn00036951
dc.identifier.issn1077-3118
dc.identifier.urihttp://hdl.handle.net/1721.1/79641
dc.description.abstractThe high intensity of light emitted in In[subscript x]Ga[subscript 1−x]N/GaN heterostructures has been generally attributed to the formation of indium-rich clusters in In[subscript x]Ga[subscript 1−x]N quantum wells (QWs). However, there is significant disagreement about the existence of such clusters in as-grown In[subscript x]Ga[subscript 1−x]N QWs. We employ atomically resolved CS-corrected scanning transmission electron microscopy and electron energy loss spectroscopy at 120 kV—which we demonstrate to be below the knock-on displacement threshold—and show that indium clustering is not present in as-grown In[subscript 0.22]Ga[subscript 0.78]N QWs. This artifact-free, atomically resolved method can be employed for investigating compositional variations in other In[subscript x]Ga[subscript 1−x]N/GaN heterostructures.en_US
dc.description.sponsorshipUnited States. Dept. of Energy. Office of Basic Energy Sciences (Contract DE-AC02- 98CH10886)en_US
dc.description.sponsorshipUnited States. Dept. of Energy. Office of Basic Energy Sciences (United States. Dept. of Energy. Center for Excitonics Award DE-SC0001088)en_US
dc.language.isoen_US
dc.publisherAmerican Institute of Physics (AIP)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.4807122en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceMIT web domainen_US
dc.titleRevisiting the “In-clustering” question in InGaN through the use of aberration-corrected electron microscopy below the knock-on thresholden_US
dc.typeArticleen_US
dc.identifier.citationBaloch, Kamal H., Aaron C. Johnston-Peck, Kim Kisslinger, Eric A. Stach, and Silvija Gradečak. “Revisiting the ‘In-clustering’ question in InGaN through the use of aberration-corrected electron microscopy below the knock-on threshold.” Applied Physics Letters 102, no. 19 (2013): 191910. © 2013 AIP Publishing LLCen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronicsen_US
dc.contributor.mitauthorBaloch, Kamal H.en_US
dc.contributor.mitauthorGradecak, Silvijaen_US
dc.relation.journalApplied Physics Lettersen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsBaloch, Kamal H.; Johnston-Peck, Aaron C.; Kisslinger, Kim; Stach, Eric A.; Gradečak, Silvijaen_US
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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