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Resonant cavity-enhanced photosensitivity in As[subscript 2]S[subscript 3] chalcogenide glass at 1550 nm telecommunication wavelength

Author(s)
Hu, Juejun; Torregiani, Matteo; Morichetti, Francesco; Carlie, Nathan; Richardson, Kathleen; Kimerling, Lionel C.; Melloni, Andrea; Agarwal, Anuradha Murthy; ... Show more Show less
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Abstract
We report the first (to our knowledge) experimental observation of resonant cavity-enhanced photosensitivity in As[subscript 2]S[subscript 3] chalcogenide glass film at 1550 nm telecommunication wavelength. The measured photosensitivity threshold is <0.1 GW/cm[superscript 2], and a photoinduced refractive index increase as large as 0.016 is observed. The photosensitive process is athermal; further, we confirm the absence of two-photon absorption in As[subscript 2]S[subscript 3], suggesting that defect absorption accounts for the energy transfer from photons to glass network. Besides its potential application for reconfigurable photonics circuit, such photosensitivity is also an important design consideration for nonlinear optical devices using chalcogenide glasses.
Date issued
2010-03
URI
http://hdl.handle.net/1721.1/79735
Department
MIT Materials Research Laboratory; Massachusetts Institute of Technology. Department of Materials Science and Engineering; Massachusetts Institute of Technology. Microphotonics Center
Journal
Optics Letters
Publisher
Optical Society of America
Citation
Hu, Juejun, Matteo Torregiani, Francesco Morichetti, Nathan Carlie, Anu Agarwal, Kathleen Richardson, Lionel C. Kimerling, and Andrea Melloni. “Resonant cavity-enhanced photosensitivity in As_2S_3 chalcogenide glass at 1550 nm telecommunication wavelength.” Optics Letters 35, no. 6 (March 15, 2010): 874. © 2010 Optical Society of America
Version: Final published version
ISSN
0146-9592
1539-4794

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