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dc.contributor.authorKimerling, Lionel C.
dc.contributor.authorCanciamilla, Antonio
dc.contributor.authorMorichetti, Francesco
dc.contributor.authorGrillanda, Stefano
dc.contributor.authorVelha, Philippe
dc.contributor.authorSorel, Marc
dc.contributor.authorSingh, Vivek
dc.contributor.authorAgarwal, Anuradha Murthy
dc.contributor.authorMelloni, Andrea
dc.date.accessioned2013-07-31T19:22:21Z
dc.date.available2013-07-31T19:22:21Z
dc.date.issued2012-06
dc.date.submitted2012-05
dc.identifier.issn1094-4087
dc.identifier.urihttp://hdl.handle.net/1721.1/79747
dc.description.abstractA chalcogenide-assisted silicon waveguide is realized by depositing a thin layer of A[subscript 2]S[subscript 3] glass onto a conventional silicon on insulator optical waveguide. The photosensitivity of the chalcogenide is exploited to locally change the optical properties of the waveguide through exposure to visible light radiation. Waveguide trimming is experimentally demonstrated by permanently shifting the resonant wavelength of a microring resonator by 6.7 nm, corresponding to an effective index increase of 1.6·10[superscript −2]. Saturation effects, trimming range, velocity and temporal stability of the process are discussed in details. Results demonstrate that photo-induced treatments can be exploited for a post-fabrication compensation of fabrication tolerances, as well as to set and reconfigure the circuit response.en_US
dc.language.isoen_US
dc.publisherOptical Society of Americaen_US
dc.relation.isversionofhttp://dx.doi.org/10.1364/OE.20.015807en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceMIT web domainen_US
dc.titlePhoto-induced trimming of chalcogenide-assisted silicon waveguidesen_US
dc.typeArticleen_US
dc.identifier.citationCanciamilla, Antonio et al. “Photo-induced Trimming of Chalcogenide-assisted Silicon Waveguides.” Optics Express 20.14 (2012): 15807. © 2012 OSAen_US
dc.contributor.departmentMIT Materials Research Laboratoryen_US
dc.contributor.departmentMassachusetts Institute of Technology. Microphotonics Centeren_US
dc.contributor.mitauthorSingh, Viveken_US
dc.contributor.mitauthorAgarwal, Anuradha Murthyen_US
dc.contributor.mitauthorKimerling, Lionel C.en_US
dc.relation.journalOptics Expressen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsWang, Jianfei; Zens, Timothy; Hu, Juejun; Becla, Piotr; Kimerling, Lionel C.; Agarwal, Anuradha M.en_US
dc.identifier.orcidhttps://orcid.org/0000-0002-0282-8309
dc.identifier.orcidhttps://orcid.org/0000-0002-3913-6189
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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