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dc.contributor.authorRuan, Shiyun
dc.contributor.authorSchuh, Christopher A
dc.date.accessioned2013-08-05T16:17:02Z
dc.date.available2013-08-05T16:17:02Z
dc.date.issued2010-04
dc.date.submitted2009-11
dc.identifier.issn00218979
dc.identifier.issn1089-7550
dc.identifier.urihttp://hdl.handle.net/1721.1/79780
dc.description.abstractA full diffusion kinetic Monte Carlo algorithm is used to model nanocrystalline film deposition, and study the mechanisms of grain nucleation and microstructure formation in such films. The major finding of this work is that new grain nucleation occurs predominantly on surface peaks. Consequently, development of a nanocrystalline structure is promoted by a growth surface with nanoscale roughness, on which new grains can nucleate and grow separately from one another. The grain minor dimension (in the plane of the film) is primarily dictated by surface peak spacing, which in turn is reduced at low temperatures and high deposition rates. The grain major dimension (in the growth direction) is related to the probability of nucleating new grains on top of pre-existing ones, with finer grains being formed at low temperatures and low grain boundary energies. Because vacancies kinetically pin grain boundaries, high vacancy content, which is obtained at high deposition rate, also favors nanograins. Consistent with empirical observations common in the experimental literature, it is found that as grains shrink, they transition from elongated to equiaxed.en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (Grant DMI-0620304)en_US
dc.description.sponsorshipUnited States. Army Research Office (Massachusetts Institute of Technology. Institute for Soldier Nanotechnologies)en_US
dc.language.isoen_US
dc.publisherAmerican Institute of Physics (AIP)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.3331986en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceMIT web domainen_US
dc.titleKinetic Monte Carlo simulations of nanocrystalline film depositionen_US
dc.typeArticleen_US
dc.identifier.citationRuan, Shiyun, and Christopher A. Schuh. “Kinetic Monte Carlo simulations of nanocrystalline film deposition.” Journal of Applied Physics 107, no. 7 (2010): 073512. © 2010 American Institute of Physicsen_US
dc.contributor.departmentMassachusetts Institute of Technology. Institute for Soldier Nanotechnologiesen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.mitauthorRuan, Shiyunen_US
dc.contributor.mitauthorSchuh, Christopher A.en_US
dc.relation.journalJournal of Applied Physicsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsRuan, Shiyun; Schuh, Christopher A.en_US
dc.identifier.orcidhttps://orcid.org/0000-0001-9856-2682
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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