dc.contributor.author | Johlin, Eric Carl | |
dc.contributor.author | Wagner, Lucas K. | |
dc.contributor.author | Buonassisi, Tonio | |
dc.contributor.author | Grossman, Jeffrey C. | |
dc.date.accessioned | 2013-09-17T18:27:23Z | |
dc.date.available | 2013-09-17T18:27:23Z | |
dc.date.issued | 2013-04 | |
dc.date.submitted | 2012-11 | |
dc.identifier.issn | 0031-9007 | |
dc.identifier.issn | 1079-7114 | |
dc.identifier.uri | http://hdl.handle.net/1721.1/80776 | |
dc.description.abstract | The inherently disordered nature of hydrogenated amorphous silicon (a-Si:H) obscures the influence of atomic features on the trapping of holes. To address this, we have created a set of over two thousand ab initio structures of a-Si:H and explored the influence of geometric factors on the occurrence of deep hole traps using density-functional theory. Statistical analysis of the relative contribution of various structures to the trap distribution shows that floating bonds and ionization-induced displacements correlate most strongly with hole traps in our ensemble. | en_US |
dc.description.sponsorship | King Fahd University of Petroleum and Minerals (Center for Clean Water and Clean Energy at MIT and KFUPM under Project No. R1-CE-08) | en_US |
dc.language.iso | en_US | |
dc.publisher | American Physical Society | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1103/PhysRevLett.110.146805 | en_US |
dc.rights | Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. | en_US |
dc.source | APS | en_US |
dc.title | Origins of Structural Hole Traps in Hydrogenated Amorphous Silicon | en_US |
dc.type | Article | en_US |
dc.identifier.citation | Johlin, Eric, Lucas K. Wagner, Tonio Buonassisi, and Jeffrey C. Grossman. Origins of Structural Hole Traps in Hydrogenated Amorphous Silicon. Physical Review Letters 110, no. 14 (April 2013). © 2013 American Physical Society. | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Mechanical Engineering | en_US |
dc.contributor.mitauthor | Johlin, Eric Carl | en_US |
dc.contributor.mitauthor | Buonassisi, Tonio | en_US |
dc.contributor.mitauthor | Grossman, Jeffrey C. | en_US |
dc.relation.journal | Physical Review Letters | en_US |
dc.eprint.version | Final published version | en_US |
dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
dspace.orderedauthors | Johlin, Eric; Wagner, Lucas K.; Buonassisi, Tonio; Grossman, Jeffrey C. | en_US |
dc.identifier.orcid | https://orcid.org/0000-0003-1281-2359 | |
dc.identifier.orcid | https://orcid.org/0000-0001-8345-4937 | |
mit.license | PUBLISHER_POLICY | en_US |
mit.metadata.status | Complete | |