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dc.contributor.authorJohlin, Eric Carl
dc.contributor.authorWagner, Lucas K.
dc.contributor.authorBuonassisi, Tonio
dc.contributor.authorGrossman, Jeffrey C.
dc.date.accessioned2013-09-17T18:27:23Z
dc.date.available2013-09-17T18:27:23Z
dc.date.issued2013-04
dc.date.submitted2012-11
dc.identifier.issn0031-9007
dc.identifier.issn1079-7114
dc.identifier.urihttp://hdl.handle.net/1721.1/80776
dc.description.abstractThe inherently disordered nature of hydrogenated amorphous silicon (a-Si:H) obscures the influence of atomic features on the trapping of holes. To address this, we have created a set of over two thousand ab initio structures of a-Si:H and explored the influence of geometric factors on the occurrence of deep hole traps using density-functional theory. Statistical analysis of the relative contribution of various structures to the trap distribution shows that floating bonds and ionization-induced displacements correlate most strongly with hole traps in our ensemble.en_US
dc.description.sponsorshipKing Fahd University of Petroleum and Minerals (Center for Clean Water and Clean Energy at MIT and KFUPM under Project No. R1-CE-08)en_US
dc.language.isoen_US
dc.publisherAmerican Physical Societyen_US
dc.relation.isversionofhttp://dx.doi.org/10.1103/PhysRevLett.110.146805en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceAPSen_US
dc.titleOrigins of Structural Hole Traps in Hydrogenated Amorphous Siliconen_US
dc.typeArticleen_US
dc.identifier.citationJohlin, Eric, Lucas K. Wagner, Tonio Buonassisi, and Jeffrey C. Grossman. Origins of Structural Hole Traps in Hydrogenated Amorphous Silicon. Physical Review Letters 110, no. 14 (April 2013). © 2013 American Physical Society.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.mitauthorJohlin, Eric Carlen_US
dc.contributor.mitauthorBuonassisi, Tonioen_US
dc.contributor.mitauthorGrossman, Jeffrey C.en_US
dc.relation.journalPhysical Review Lettersen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsJohlin, Eric; Wagner, Lucas K.; Buonassisi, Tonio; Grossman, Jeffrey C.en_US
dc.identifier.orcidhttps://orcid.org/0000-0003-1281-2359
dc.identifier.orcidhttps://orcid.org/0000-0001-8345-4937
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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