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dc.contributor.authorLi, Luozhou
dc.contributor.authorGaathon, Ophir
dc.contributor.authorChen, Edward H.
dc.contributor.authorTrusheim, Matthew E.
dc.contributor.authorEnglund, Dirk Robert
dc.date.accessioned2014-04-14T16:53:26Z
dc.date.available2014-04-14T16:53:26Z
dc.date.issued2013-06
dc.identifier.isbn978-1-55752-972-5
dc.identifier.urihttp://hdl.handle.net/1721.1/86154
dc.description.abstractWe demonstrate a fabrication technique for high volume production of high quality nanocrystals from bulk chemical vapor deposition diamond. Ramsey and Spin-Echo measurements confirm the long spin coherence of nitrogen vacancy centers in these nanocrystals.en_US
dc.language.isoen_US
dc.publisherOptical Society of Americaen_US
dc.relation.isversionofhttp://dx.doi.org/10.1364/CLEO_QELS.2013.QM2B.6en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceOptical Society of Americaen_US
dc.titleTop-Down, Scalable Fabrication of High Purity Fluorescent Nanodiamondsen_US
dc.typeArticleen_US
dc.identifier.citationTrusheim, Matthew, Luozhou Li, Ophir Gaathon, Edward H. Chen, and Dirk Englund. “Top-Down, Scalable Fabrication of High Purity Fluorescent Nanodiamonds.” CLEO: 2013 Technical Digest (2013). © 2013 OSAen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.mitauthorTrusheim, Matthew E.en_US
dc.contributor.mitauthorChen, Edward H.en_US
dc.contributor.mitauthorEnglund, Dirk Roberten_US
dc.relation.journalCLEO: 2013 Technical Digesten_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/ConferencePaperen_US
eprint.statushttp://purl.org/eprint/status/NonPeerRevieweden_US
dspace.orderedauthorsTrusheim, Matthew; Li, Luozhou; Gaathon, Ophir; Chen, Edward H.; Englund, Dirken_US
dc.identifier.orcidhttps://orcid.org/0000-0001-7902-3456
dc.identifier.orcidhttps://orcid.org/0000-0001-7217-7137
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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