Show simple item record

dc.contributor.authorHook, Andrew L.
dc.contributor.authorScurr, David J.
dc.contributor.authorBurley, Jonathan C.
dc.contributor.authorAnderson, Daniel Griffith
dc.contributor.authorDavies, Martyn C.
dc.contributor.authorAlexander, Morgan R.
dc.contributor.authorLanger, Robert S
dc.date.accessioned2014-10-31T14:15:57Z
dc.date.available2014-10-31T14:15:57Z
dc.date.issued2013
dc.date.submitted2012-11
dc.identifier.issn2050-750X
dc.identifier.issn2050-7518
dc.identifier.urihttp://hdl.handle.net/1721.1/91249
dc.description.abstractPolymer microarrays are a key enabling technology for the discovery of novel materials. This technology can be further enhanced by expanding the combinatorial space represented on an array. However, not all materials are compatible with the microarray format and materials must be screened to assess their suitability with the microarray manufacturing methodology prior to their inclusion in a materials discovery investigation. In this study a library of materials expressed on the microarray format are assessed by light microscopy, atomic force microscopy and time-of-flight secondary ion mass spectrometry to identify compositions with defects that cause a polymer spot to exhibit surface properties significantly different from a smooth, round, chemically homogeneous ‘normal’ spot. It was demonstrated that the presence of these defects could be predicted in 85% of cases using a partial least square regression model based upon molecular descriptors of the monomer components of the polymeric materials. This may allow for potentially defective materials to be identified prior to their formation. Analysis of the PLS regression model highlighted some chemical properties that influenced the formation of defects, and in particular suggested that mixing a methacrylate and an acrylate monomer and/or mixing monomers with long and linear or short and bulky pendant groups will prevent the formation of defects. These results are of interest for the formation of polymer microarrays and may also inform the formulation of printed polymer materials generally.en_US
dc.description.sponsorshipBurroughs Wellcome Fund (grant number 085245)en_US
dc.description.sponsorshipRoyal Society (Great Britain) (Wolfson Research Merit Award)en_US
dc.language.isoen_US
dc.publisherRoyal Society of Chemistryen_US
dc.relation.isversionofhttp://dx.doi.org/10.1039/c2tb00379aen_US
dc.rightsCreative Commons Attribution-NonCommercial 3.0 Unported Licenseen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc/3.0en_US
dc.sourceRoyal Society of Chemistryen_US
dc.titleAnalysis and prediction of defects in UV photo-initiated polymer microarraysen_US
dc.typeArticleen_US
dc.identifier.citationHook, Andrew L., David J. Scurr, Jonathan C. Burley, Robert Langer, Daniel G. Anderson, Martyn C. Davies, and Morgan R. Alexander. “Analysis and Prediction of Defects in UV Photo-Initiated Polymer Microarrays.” Journal of Materials Chemistry B 1, no. 7 (2013): 1035.en_US
dc.contributor.departmentdeleteen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemical Engineeringen_US
dc.contributor.departmentKoch Institute for Integrative Cancer Research at MITen_US
dc.contributor.mitauthorLanger, Roberten_US
dc.contributor.mitauthorAnderson, Daniel Griffithen_US
dc.relation.journalJournal of Materials Chemistry Ben_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsHook, Andrew L.; Scurr, David J.; Burley, Jonathan C.; Langer, Robert; Anderson, Daniel G.; Davies, Martyn C.; Alexander, Morgan R.en_US
dc.identifier.orcidhttps://orcid.org/0000-0001-5629-4798
dc.identifier.orcidhttps://orcid.org/0000-0003-4255-0492
mit.licensePUBLISHER_CCen_US


Files in this item

Thumbnail

This item appears in the following Collection(s)

Show simple item record