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dc.contributor.authorRodriguez-Nieva, J. F.
dc.contributor.authorBarros, Eduardo B.
dc.contributor.authorSaito, R.
dc.contributor.authorDresselhaus, Mildred
dc.date.accessioned2014-12-08T20:56:07Z
dc.date.available2014-12-08T20:56:07Z
dc.date.issued2014-12
dc.date.submitted2014-08
dc.identifier.issn1098-0121
dc.identifier.issn1550-235X
dc.identifier.urihttp://hdl.handle.net/1721.1/92236
dc.description.abstractAn analytical study is presented of the double resonant Raman scattering process in graphene, responsible for the D and D′ features in the Raman spectra. This work yields analytical expressions for the D and D′ integrated Raman intensities that explicitly show the dependencies on laser energy, defect concentration, and electronic lifetime. Good agreement is obtained between the analytical results and experimental measurements on samples with increasing defect concentrations and at various laser excitation energies. The use of Raman spectroscopy to identify the nature of defects is discussed. Comparison between the models for the edge-induced and the disorder-induced D-band intensity suggests that edges or grain boundaries can be distinguished from disorder by the different dependence of their Raman intensity on laser excitation energy. Similarly, the type of disorder can potentially be identified not only by the intensity ratio [ [I subscript D] over [I subscript D′]], but also by its laser energy dependence. Also discussed is a quantitative analysis of quantum interference effects of the graphene wave functions, which determine the most important phonon wave vectors and scattering processes responsible for the D and D′ bands.en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (Grant DMR1004147)en_US
dc.description.sponsorshipConselho Nacional de Pesquisas (Brazil) (Grant 245640/2012-6)en_US
dc.description.sponsorshipFundação Cearense de Apoio ao Desenvolvimento Científico e Tecnológicoen_US
dc.publisherAmerican Physical Societyen_US
dc.relation.isversionofhttp://dx.doi.org/10.1103/PhysRevB.90.235410en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceAmerican Physical Societyen_US
dc.titleDisorder-induced double resonant Raman process in grapheneen_US
dc.typeArticleen_US
dc.identifier.citationRodriguez-Nieva, J. F. et al. “Disorder-Induced Double Resonant Raman Process in Graphene.” Physical Review B 90.23 (2014): 235410-1-9. © 2014 American Physical Societyen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Physicsen_US
dc.contributor.mitauthorDresselhaus, Mildreden_US
dc.contributor.mitauthorRodriguez-Nieva, J. F.en_US
dc.contributor.mitauthorBarros, Eduardo B.en_US
dc.relation.journalPhysical Review Ben_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2014-12-03T23:00:03Z
dc.language.rfc3066en
dc.rights.holderAmerican Physical Society
dspace.orderedauthorsRodriguez-Nieva, J. F.; Barros, E. B.; Saito, R.; Dresselhaus, M. S.en_US
dc.identifier.orcidhttps://orcid.org/0000-0001-8492-2261
dc.identifier.orcidhttps://orcid.org/0000-0002-3023-396X
dspace.mitauthor.errortrue
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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