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dc.contributor.authorTsvetkov, Nikolai
dc.contributor.authorLu, Qiyang
dc.contributor.authorChen, Yan
dc.contributor.authorYildiz, Bilge
dc.date.accessioned2015-03-13T16:02:24Z
dc.date.available2015-03-13T16:02:24Z
dc.date.issued2013-10
dc.identifier.issn1938-6737
dc.identifier.issn1938-5862
dc.identifier.urihttp://hdl.handle.net/1721.1/96014
dc.description.abstractThe influence of lattice strain on non-stoichiometry and surface chemical composition was investigated for epitaxial Nd2NiO4+ä (NNO) films during annealing in ultra high vacuum (below 10[superscript -8] mbar) and temperatures of up to 700oC. (100)- and (001)-oriented films with tensile and compressive lattice strain along c-axis were fabricated using pulsed laser deposition method. A significant decrease in the c-lattice parameter during annealing was found by x-ray diffraction (XRD) for the tensile strained films. X-ray photoelectron spectroscopy (XPS) showed that Ni reduction during annealing takes place only in compressively strained films, indicating the lower content of oxygen interstitials. A lower interstitial content in the compressively strained NNO films is consistent with the smaller c-lattice parameter measured by XRD and the easier reducibility of Ni measured by XPS. Cation segregation and morphological changes were found only for the compressively strained film surfaces. These results show that lattice strain along the c-axis is an important parameter that can alter the surface chemistry, and thus the oxygen exchange kinetics, on Nd2NiO4+ä at elevated temperatures.en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (Division of Materials Research, Ceramics Program, CAREER award)en_US
dc.language.isoen_US
dc.publisherElectrochemical Societyen_US
dc.relation.isversionofhttp://dx.doi.org/10.1149/05701.1743ecsten_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceMIT web domainen_US
dc.titleSurface Chemistry and Non-Stoichiometry of Nd2NiO4+  Epitaxial Thin Films with Different Orientation and Strainen_US
dc.typeArticleen_US
dc.identifier.citationTsvetkov, N., Q. Lu, Y. Chen, and B. Yildiz. “Surface Chemistry and Non-Stoichiometry of Nd2NiO4+  Epitaxial Thin Films with Different Orientation and Strain.” ECS Transactions 57, no. 1 (October 6, 2013): 1743–1752. © 2013 Electrochemical Society.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Nuclear Science and Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Laboratory of Electrochemical Interfacesen_US
dc.contributor.mitauthorTsvetkov, Nikolaien_US
dc.contributor.mitauthorLu, Qiyangen_US
dc.contributor.mitauthorChen, Yanen_US
dc.contributor.mitauthorYildiz, Bilgeen_US
dc.relation.journalECS Transactionsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsTsvetkov, N.; Lu, Q.; Chen, Y.; Yildiz, B.en_US
dc.identifier.orcidhttps://orcid.org/0000-0002-2688-5666
dc.identifier.orcidhttps://orcid.org/0000-0001-6063-023X
dc.identifier.orcidhttps://orcid.org/0000-0003-4690-5334
dc.identifier.orcidhttps://orcid.org/0000-0002-9155-3684
mit.licensePUBLISHER_POLICYen_US


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