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dc.contributor.authorKrich, Jacob J.
dc.contributor.authorAkey, Austin J.
dc.contributor.authorRecht, D.
dc.contributor.authorAziz, Michael J.
dc.contributor.authorSullivan, Joseph T.
dc.contributor.authorSimmons, Christie
dc.contributor.authorBuonassisi, Tonio
dc.date.accessioned2015-06-08T19:14:47Z
dc.date.available2015-06-08T19:14:47Z
dc.date.issued2013-09
dc.date.submitted2013-05
dc.identifier.issn00218979
dc.identifier.issn1089-7550
dc.identifier.urihttp://hdl.handle.net/1721.1/97227
dc.description.abstractWe present a methodology for estimating the efficiency potential for candidate impurity-band photovoltaic materials from empirical measurements. This methodology employs both Fourier transform infrared spectroscopy and low-temperature photoconductivity to calculate a “performance figure of merit” and to determine both the position and bandwidth of the impurity band. We evaluate a candidate impurity-band material, silicon hyperdoped with sulfur; we find that the figure of merit is more than one order of magnitude too low for photovoltaic devices that exceed the thermodynamic efficiency limit for single band gap materials.en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (Energy, Power, and Adaptive Systems Grant Contract ECCS-1102050)en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (United States. Dept. of Energy NSF CA EEC-1041895)en_US
dc.description.sponsorshipCenter for Clean Water and Clean Energy at MIT and KFUPMen_US
dc.language.isoen_US
dc.publisherAmerican Institute of Physics (AIP)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.4820454en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceOther univ. web domainen_US
dc.titleMethodology for vetting heavily doped semiconductors for intermediate band photovoltaics: A case study in sulfur-hyperdoped siliconen_US
dc.typeArticleen_US
dc.identifier.citationSullivan, J. T., C. B. Simmons, J. J. Krich, A. J. Akey, D. Recht, M. J. Aziz, and T. Buonassisi. “Methodology for Vetting Heavily Doped Semiconductors for Intermediate Band Photovoltaics: A Case Study in Sulfur-Hyperdoped Silicon.” Journal of Applied Physics 114, no. 10 (2013): 103701. © 2013 AIP Publishing LLCen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Photovoltaic Research Laboratoryen_US
dc.contributor.mitauthorSullivan, Joseph T.en_US
dc.contributor.mitauthorSimmons, Christieen_US
dc.contributor.mitauthorBuonassisi, Tonioen_US
dc.relation.journalJournal of Applied Physicsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsSullivan, J. T.; Simmons, C. B.; Krich, J. J.; Akey, A. J.; Recht, D.; Aziz, M. J.; Buonassisi, T.en_US
dc.identifier.orcidhttps://orcid.org/0000-0001-8345-4937
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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