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dc.contributor.authorMaser, Jorg
dc.contributor.authorLai, Barry
dc.contributor.authorBuonassisi, Tonio
dc.contributor.authorCai, Zhonghou
dc.contributor.authorChen, Si
dc.contributor.authorFinney, Lydia
dc.contributor.authorGleber, Sophie-Charlotte
dc.contributor.authorHarder, Ross
dc.contributor.authorJacobsen, Chris
dc.contributor.authorLiu, Wenjun
dc.contributor.authorMurray, Conal
dc.contributor.authorPreissner, Curt
dc.contributor.authorRoehrig, Chris
dc.contributor.authorRose, Volker
dc.contributor.authorShu, Deming
dc.contributor.authorVine, David
dc.contributor.authorVogt, Stefan
dc.date.accessioned2015-06-09T13:30:55Z
dc.date.available2015-06-09T13:30:55Z
dc.date.issued2013-09
dc.identifier.issn0277-786X
dc.identifier.urihttp://hdl.handle.net/1721.1/97233
dc.description.abstractThe Advanced Photon Source is currently developing a suite of new hard x-ray beamlines, aimed primarily at the study of materials and devices under real conditions. One of the flagship beamlines of the APS Upgrade is the In-Situ Nanoprobe beamline (ISN beamline), which will provide in-situ and operando characterization of advanced energy materials and devices under change of temperature and gases, under applied fields, in 3D. The ISN beamline is designed to deliver spatially coherent x-rays with photon energies between 4 keV and 30 keV to the ISN instrument. As an x-ray source, a revolver-type undulator with two interchangeable magnetic structures, optimized to provide high brilliance throughout the range of photon energies of 4 keV – 30 keV, will be used. The ISN instrument will provide a smallest hard x-ray spot of 20 nm using diffractive optics, with sensitivity to sub-10 nm sample structures using coherent diffraction. Using nanofocusing mirrors in Kirkpatrick-Baez geometry, the ISN will also provide a focus of 50 nm with a flux of 8·1011 Photons/s at a photon energy of 10 keV, several orders of magnitude larger than what is currently available. This will allow imaging of trace amounts of most elements in the periodic table, with a sensitivity to well below 100 atoms for most metals in thin samples. It will also enable nanospectroscopic studies of the chemical state of most materials relevant to energy science. The ISN beamline will be primarily used to study inorganic and organic photovoltaic systems, advanced batteries and fuel cells, nanoelectronics devices, and materials and systems diesigned to reduce the environmental impact of combustion.en_US
dc.description.sponsorshipUnited States. Dept. of Energy (SunShot Initiative Contract DE-EE0005314)en_US
dc.description.sponsorshipUnited States. Dept. of Energy (SunShot Initiative Contract DE-EE0005329)en_US
dc.description.sponsorshipUnited States. Dept. of Energy (SunShot Initiative Contract DE-EE0005948)en_US
dc.language.isoen_US
dc.publisherSPIEen_US
dc.relation.isversionofhttp://dx.doi.org/10.1117/12.2026418en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceSPIEen_US
dc.titleA next-generation in-situ nanoprobe beamline for the Advanced Photon Sourceen_US
dc.typeArticleen_US
dc.identifier.citationMaser, Jorg, Barry Lai, Tonio Buonassisi, Zhonghou Cai, Si Chen, Lydia Finney, Sophie-Charlotte Gleber, et al. “A Next-Generation in-Situ Nanoprobe Beamline for the Advanced Photon Source.” Edited by Barry Lai. X-Ray Nanoimaging: Instruments and Methods (September 26, 2013). © 2013 Society of Photo-Optical Instrumentation Engineers (SPIE)en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.mitauthorBuonassisi, Tonioen_US
dc.relation.journalProceedings of SPIE--the International Society for Optical Engineeringen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/ConferencePaperen_US
eprint.statushttp://purl.org/eprint/status/NonPeerRevieweden_US
dspace.orderedauthorsMaser, Jorg; Lai, Barry; Buonassisi, Tonio; Cai, Zhonghou; Chen, Si; Finney, Lydia; Gleber, Sophie-Charlotte; Harder, Ross; Jacobsen, Chris; Liu, Wenjun; Murray, Conal; Preissner, Curt; Roehrig, Chris; Rose, Volker; Shu, Deming; Vine, David; Vogt, Stefanen_US
dc.identifier.orcidhttps://orcid.org/0000-0001-8345-4937
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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