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dc.contributor.authorPetrzelka, Joseph E.
dc.contributor.authorHardt, David E.
dc.date.accessioned2015-06-17T15:09:08Z
dc.date.available2015-06-17T15:09:08Z
dc.date.issued2013-02
dc.identifier.issn0277-786X
dc.identifier.urihttp://hdl.handle.net/1721.1/97452
dc.description.abstractImplementations of roll to roll contact lithography require new approaches towards manufacturing tooling, including stamps for roll to roll nanoimprint lithography (NIL) and soft lithography. Suitable roll based tools must have seamless micro- or nano-scale patterns and must be scalable to roll widths of one meter. The authors have developed a new centrifugal stamp casting process that can produce uniform cylindrical polymer stamps in a scalable manner. The pattern on the resulting polymer tool is replicated against a corresponding master pattern on the inner diameter of a centrifuge drum. This master pattern is created in photoresist using a UV laser direct write system. This paper discusses the design and implementation of a laser direct write system targeting the internal diameter of a rotating drum. The design uses flying optics to focus a laser beam along the axis of the centrifuge drum and to redirect the beam towards the drum surface. Experimental patterning results show uniform coatings of negative photoresist in the centrifuge drum that are effectively patterned with a 405 nm laser diode. Seamless patterns are shown to be replicated in a 50 mm diameter, 60 mm long cylindrical stamp made from polydimethylsiloxane (PDMS). Direct write results show gratings with line widths of 10 microns in negative photoresist. Using an FPGA, the laser can be accurately timed against the centrifuge encoder to create complex patterns.en_US
dc.description.sponsorshipCenter for Clean Water and Clean Energy at MIT and KFUPMen_US
dc.language.isoen_US
dc.publisherSPIEen_US
dc.relation.isversionofhttp://dx.doi.org/10.1117/12.2004738en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceSPIEen_US
dc.titleLaser direct write system for fabricating seamless roll-to-roll lithography toolsen_US
dc.typeArticleen_US
dc.identifier.citationPetrzelka, Joseph E., and David E. Hardt. “Laser Direct Write System for Fabricating Seamless Roll-to-Roll Lithography Tools.” Edited by Mary Ann Maher and Paul J. Resnick. Micromachining and Microfabrication Process Technology XVIII (March 9, 2013). © 2013 Society of Photo-Optical Instrumentation Engineers (SPIE)en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.mitauthorPetrzelka, Joseph E.en_US
dc.contributor.mitauthorHardt, David E.en_US
dc.relation.journalProceedings of SPIE--the International Society for Optical Engineeringen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/ConferencePaperen_US
eprint.statushttp://purl.org/eprint/status/NonPeerRevieweden_US
dspace.orderedauthorsPetrzelka, Joseph E.; Hardt, David E.en_US
mit.licensePUBLISHER_POLICYen_US


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