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dc.contributor.authorShin, Taeho
dc.contributor.authorWolfson, Johanna W.
dc.contributor.authorKandyla, Maria
dc.contributor.authorTeitelbaum, Samuel Welch
dc.contributor.authorNelson, Keith Adam
dc.date.accessioned2015-11-13T15:29:19Z
dc.date.available2015-11-13T15:29:19Z
dc.date.issued2015-11
dc.date.submitted2015-07
dc.identifier.issn1098-0121
dc.identifier.issn1550-235X
dc.identifier.urihttp://hdl.handle.net/1721.1/99920
dc.description.abstractFemtosecond pump-probe spectroscopy of bismuth thin films has revealed strong dependencies of reflectivity and phonon frequency on film thickness in the range of 25−40 nm. The reflectivity variations are ascribed to distinct electronic structures originating from strongly varying electronic temperatures and proximity of the film thickness to the optical penetration depth of visible light. The phonon frequency is redshifted by an amount that increases with decreasing film thickness under the same excitation fluence, indicating carrier density-dependent bond softening that increases due to suppressed diffusion of carriers away from the photoexcited region in thin films. The results have significant implications for nonthermal melting of bismuth as well as lattice heating due to inelastic electron-phonon scattering.en_US
dc.description.sponsorshipUnited States. Office of Naval Research (Grant N00014-12-1-0530)en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (Grant CHE-1111557)en_US
dc.publisherAmerican Physical Societyen_US
dc.relation.isversionofhttp://dx.doi.org/10.1103/PhysRevB.92.184302en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceAmerican Physical Societyen_US
dc.titleCarrier confinement and bond softening in photoexcited bismuth filmsen_US
dc.typeArticleen_US
dc.identifier.citationShin, Taeho, Johanna W. Wolfson, Samuel W. Teitelbaum, Maria Kandyla, and Keith A. Nelson. “Carrier Confinement and Bond Softening in Photoexcited Bismuth Films.” Physical Review B 92, no. 18 (November 2015). © 2015 American Physical Societyen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemistryen_US
dc.contributor.mitauthorShin, Taehoen_US
dc.contributor.mitauthorWolfson, Johanna W.en_US
dc.contributor.mitauthorTeitelbaum, Samuel Welchen_US
dc.contributor.mitauthorKandyla, Mariaen_US
dc.contributor.mitauthorNelson, Keith Adamen_US
dc.relation.journalPhysical Review Ben_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2015-11-10T23:00:03Z
dc.language.rfc3066en
dc.rights.holderAmerican Physical Society
dspace.orderedauthorsShin, Taeho; Wolfson, Johanna W.; Teitelbaum, Samuel W.; Kandyla, Maria; Nelson, Keith A.en_US
dc.identifier.orcidhttps://orcid.org/0000-0001-7804-5418
dc.identifier.orcidhttps://orcid.org/0000-0002-0812-9832
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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