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dc.contributor.authorGangloff, Dorian
dc.contributor.authorShi, Molu
dc.contributor.authorWu, Tailin
dc.contributor.authorBylinskii, Alexei
dc.contributor.authorBraverman, Boris
dc.contributor.authorNichols, Rosanna
dc.contributor.authorLi, Junru
dc.contributor.authorAichholz, Kai
dc.contributor.authorCetina, Marko
dc.contributor.authorKarpa, Leon
dc.contributor.authorGutierrez, Michael Steven
dc.contributor.authorJelenkovic, Branislav
dc.contributor.authorVuletic, Vladan
dc.contributor.authorChuang, Isaac L.
dc.date.accessioned2015-11-16T13:08:46Z
dc.date.available2015-11-16T13:08:46Z
dc.date.issued2015-07
dc.date.submitted2015-06
dc.identifier.issn1094-4087
dc.identifier.urihttp://hdl.handle.net/1721.1/99933
dc.description.abstractHigh-finesse optical cavities placed under vacuum are foundational platforms in quantum information science with photons and atoms. We study the vacuum-induced degradation of high-finesse optical cavities with mirror coatings composed of SiO[subscript 2]-Ta[subscript 2]O[subscript 5] dielectric stacks, and present methods to protect these coatings and to recover their initial low loss levels. For separate coatings with reflectivities centered at 370 nm and 422 nm, a vacuum-induced continuous increase in optical loss occurs if the surface-layer coating is made of Ta[subscript 2]O[subscript 5], while it does not occur if it is made of SiO[subscript 2]. The incurred optical loss can be reversed by filling the vacuum chamber with oxygen at atmospheric pressure, and the recovery rate can be strongly accelerated by continuous laser illumination at 422 nm. Both the degradation and the recovery processes depend strongly on temperature. We find that a 1 nm-thick layer of SiO[subscript 2] passivating the Ta[subscript 2]O[subscript 5] surface layer is sufficient to reduce the degradation rate by more than a factor of 10, strongly supporting surface oxygen depletion as the primary degradation mechanism.en_US
dc.description.sponsorshipNational Science Foundation (U.S.). Center for Ultracold Atomsen_US
dc.description.sponsorshipUnited States. Intelligence Advanced Research Projects Activity. Multi-Qubit Coherent Operations Programen_US
dc.language.isoen_US
dc.publisherOptical Society of Americaen_US
dc.relation.isversionofhttp://dx.doi.org/10.1364/oe.23.018014en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alikeen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/4.0/en_US
dc.sourcearXiven_US
dc.titlePreventing and reversing vacuum-induced optical losses in high-finesse tantalum (V) oxide mirror coatingsen_US
dc.typeArticleen_US
dc.identifier.citationGangloff, Dorian, Molu Shi, Tailin Wu, Alexei Bylinskii, Boris Braverman, Michael Gutierrez, Rosanna Nichols, et al. “Preventing and Reversing Vacuum-Induced Optical Losses in High-Finesse Tantalum (V) Oxide Mirror Coatings.” Optics Express 23, no. 14 (2015): 18014.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Physicsen_US
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronicsen_US
dc.contributor.departmentMIT-Harvard Center for Ultracold Atomsen_US
dc.contributor.mitauthorGangloff, Dorianen_US
dc.contributor.mitauthorShi, Moluen_US
dc.contributor.mitauthorWu, Tailinen_US
dc.contributor.mitauthorBylinskii, Alexeien_US
dc.contributor.mitauthorBraverman, Borisen_US
dc.contributor.mitauthorGutierrez, Michael Stevenen_US
dc.contributor.mitauthorNichols, Rosannaen_US
dc.contributor.mitauthorLi, Junruen_US
dc.contributor.mitauthorAichholz, Kaien_US
dc.contributor.mitauthorCetina, Markoen_US
dc.contributor.mitauthorKarpa, Leonen_US
dc.contributor.mitauthorChuang, Isaacen_US
dc.contributor.mitauthorVuletic, Vladanen_US
dc.relation.journalOptics Expressen_US
dc.eprint.versionOriginal manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/NonPeerRevieweden_US
dspace.orderedauthorsGangloff, Dorian; Shi, Molu; Wu, Tailin; Bylinskii, Alexei; Braverman, Boris; Gutierrez, Michael; Nichols, Rosanna; Li, Junru; Aichholz, Kai; Cetina, Marko; Karpa, Leon; Jelenkovic, Branislav; Chuang, Isaac; Vuletic, Vladanen_US
dc.identifier.orcidhttps://orcid.org/0000-0001-7296-523X
dc.identifier.orcidhttps://orcid.org/0000-0002-7054-2310
dc.identifier.orcidhttps://orcid.org/0000-0001-8586-4999
dc.identifier.orcidhttps://orcid.org/0000-0001-5193-2711
dc.identifier.orcidhttps://orcid.org/0000-0002-9786-0538
dc.identifier.orcidhttps://orcid.org/0000-0001-6155-9463
dc.identifier.orcidhttps://orcid.org/0000-0001-8276-8256
dc.identifier.orcidhttps://orcid.org/0000-0002-8069-8327
dc.identifier.orcidhttps://orcid.org/0000-0002-7100-0847
mit.licenseOPEN_ACCESS_POLICYen_US
mit.metadata.statusComplete


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