Optical nanolithography with λ/15 resolution using bowtie aperture array

Author(s)
Wen, Xiaolei; Srisungsitthisunti, Pornsak; Xu, Xianfan; Traverso, Luis M.; Moon, Euclid Eberle
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Abstract
We report optical parallel nanolithography using bowtie apertures with the help of the interferometric-spatial-phase-imaging (ISPI) technique. The ISPI system can detect and control the distance between the bowtie aperture, and photoresist with a resolution of sub-nanometer level. It overcomes the difficulties brought by the light divergence of bowtie apertures. Parallel nanolithography with feature size of 22 ± 5 nm is achieved. This technique combines high resolution, parallel throughput, and low cost, which is promising for practical applications.
Date issued
2014-01
URI
http://hdl.handle.net/1721.1/104444
Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Journal
Applied Physics A
Publisher
Springer Berlin Heidelberg
Citation
Wen, Xiaolei et al. “Optical Nanolithography with λ/15 Resolution Using Bowtie Aperture Array.” Applied Physics A 117.1 (2014): 307–311.
Version: Author's final manuscript
ISSN
0947-8396
1432-0630
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