| dc.contributor.author | Wen, Xiaolei | |
| dc.contributor.author | Srisungsitthisunti, Pornsak | |
| dc.contributor.author | Xu, Xianfan | |
| dc.contributor.author | Traverso, Luis M. | |
| dc.contributor.author | Moon, Euclid Eberle | |
| dc.date.accessioned | 2016-09-29T18:48:37Z | |
| dc.date.available | 2016-09-29T18:48:37Z | |
| dc.date.issued | 2014-01 | |
| dc.date.submitted | 2013-10 | |
| dc.identifier.issn | 0947-8396 | |
| dc.identifier.issn | 1432-0630 | |
| dc.identifier.uri | http://hdl.handle.net/1721.1/104444 | |
| dc.description.abstract | We report optical parallel nanolithography using bowtie apertures with the help of the interferometric-spatial-phase-imaging (ISPI) technique. The ISPI system can detect and control the distance between the bowtie aperture, and photoresist with a resolution of sub-nanometer level. It overcomes the difficulties brought by the light divergence of bowtie apertures. Parallel nanolithography with feature size of 22 ± 5 nm is achieved. This technique combines high resolution, parallel throughput, and low cost, which is promising for practical applications. | en_US |
| dc.description.sponsorship | United States. Defense Advanced Research Projects Agency (Grant N66001-08-1-2037) | en_US |
| dc.description.sponsorship | National Science Foundation (U.S.) (Grant CMMI-1120577) | en_US |
| dc.publisher | Springer Berlin Heidelberg | en_US |
| dc.relation.isversionof | http://dx.doi.org/10.1007/s00339-014-8265-y | en_US |
| dc.rights | Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. | en_US |
| dc.source | Springer Berlin Heidelberg | en_US |
| dc.title | Optical nanolithography with λ/15 resolution using bowtie aperture array | en_US |
| dc.type | Article | en_US |
| dc.identifier.citation | Wen, Xiaolei et al. “Optical Nanolithography with λ/15 Resolution Using Bowtie Aperture Array.” Applied Physics A 117.1 (2014): 307–311. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | en_US |
| dc.contributor.mitauthor | Moon, Euclid Eberle | |
| dc.relation.journal | Applied Physics A | en_US |
| dc.eprint.version | Author's final manuscript | en_US |
| dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
| eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
| dc.date.updated | 2016-08-18T15:24:58Z | |
| dc.language.rfc3066 | en | |
| dc.rights.holder | Springer-Verlag Berlin Heidelberg | |
| dspace.orderedauthors | Wen, Xiaolei; Traverso, Luis M.; Srisungsitthisunti, Pornsak; Xu, Xianfan; Moon, Euclid E. | en_US |
| dspace.embargo.terms | N | en |
| mit.license | PUBLISHER_POLICY | en_US |
| mit.metadata.status | Complete | |
