Parallel Stitching of Two-Dimensional Materials
Author(s)
Lee, Yi-Hsien; Zhu, Yimei; Wu, Lijun; Ling, Xi; Lin, Yuxuan; Ma, Qiong; Wang, Ziqiang; Song, Yi; Yu, Lili; Huang, Shengxi; Fang, Wenjing; Zhang, Xu; Bie, Yaqing; Li, Ju; Jarillo-Herrero, Pablo; Dresselhaus, Mildred; Palacios, Tomas; Kong, Jing; Hsu, Allen; ... Show more Show less
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Open Access Policy
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Alternative title
Parallel Stitching of 2D Materials
Terms of use
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Show full item recordAbstract
Diverse parallel stitched 2D heterostructures, including metal–semiconductor, semiconductor–semiconductor, and insulator–semiconductor, are synthesized directly through selective “sowing” of aromatic molecules as the seeds in the chemical vapor deposition (CVD) method. The methodology enables the large-scale fabrication of lateral heterostructures, which offers tremendous potential for its application in integrated circuits.
Date issued
2016-01Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science; Massachusetts Institute of Technology. Department of Materials Science and Engineering; Massachusetts Institute of Technology. Department of Nuclear Science and Engineering; Massachusetts Institute of Technology. Department of Physics; Massachusetts Institute of Technology. Research Laboratory of ElectronicsJournal
Advanced Materials
Publisher
John Wiley & Sons
Citation
Ling, Xi et al. “Parallel Stitching of 2D Materials.” Advanced Materials vol. 28, issue 12, March 2016, pp. 2322–2329.
Version: Original manuscript
ISSN
09359648
15214095