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Parallel Stitching of Two-Dimensional Materials

dc.contributor.authorLee, Yi-Hsien
dc.contributor.authorZhu, Yimei
dc.contributor.authorWu, Lijun
dc.contributor.authorLing, Xi
dc.contributor.authorLin, Yuxuan
dc.contributor.authorMa, Qiong
dc.contributor.authorWang, Ziqiang
dc.contributor.authorSong, Yi
dc.contributor.authorYu, Lili
dc.contributor.authorHuang, Shengxi
dc.contributor.authorFang, Wenjing
dc.contributor.authorZhang, Xu
dc.contributor.authorBie, Yaqing
dc.contributor.authorLi, Ju
dc.contributor.authorJarillo-Herrero, Pablo
dc.contributor.authorDresselhaus, Mildred
dc.contributor.authorPalacios, Tomas
dc.contributor.authorKong, Jing
dc.contributor.authorHsu, Allen
dc.date.accessioned2016-10-19T20:47:38Z
dc.date.available2016-10-19T20:47:38Z
dc.date.issued2016-01
dc.date.submitted2015-11
dc.identifier.issn09359648
dc.identifier.issn15214095
dc.identifier.urihttp://hdl.handle.net/1721.1/104870
dc.description.abstractDiverse parallel stitched 2D heterostructures, including metal–semiconductor, semiconductor–semiconductor, and insulator–semiconductor, are synthesized directly through selective “sowing” of aromatic molecules as the seeds in the chemical vapor deposition (CVD) method. The methodology enables the large-scale fabrication of lateral heterostructures, which offers tremendous potential for its application in integrated circuits.en_US
dc.description.sponsorshipMassachusetts Institute of Technology. Institute for Soldier Nanotechnologies (Award No. 023674)en_US
dc.description.sponsorshipNational Science Foundation (U.S.). Division of Materials Research. (Award No. 1004147)en_US
dc.description.sponsorshipUnited States. Department of Energy. (Award No. DE-SC0001299)en_US
dc.description.sponsorshipUnited States. Office of Naval Research. Presidential Early Career Award for Scientists and Engineers (Award No. 021302-001)en_US
dc.description.sponsorshipUnited States. Department of Energy. (Contract No. DE-AC02-98CH10886)en_US
dc.description.sponsorshipChina. Ministry of Science and Technology. (MOST 103-2112-M-007-001-MY3)en_US
dc.language.isoen_US
dc.publisherJohn Wiley & Sonsen_US
dc.relation.isversionofhttp://dx.doi.org/10.1002/adma.201505070en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alikeen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/4.0/en_US
dc.sourcearXiven_US
dc.titleParallel Stitching of Two-Dimensional Materialsen_US
dc.title.alternativeParallel Stitching of 2D Materialsen_US
dc.typeArticleen_US
dc.identifier.citationLing, Xi et al. “Parallel Stitching of 2D Materials.” Advanced Materials vol. 28, issue 12, March 2016, pp. 2322–2329.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Nuclear Science and Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Physicsen_US
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronicsen_US
dc.contributor.mitauthorLing, Xi
dc.contributor.mitauthorLin, Yuxuan
dc.contributor.mitauthorMa, Qiong
dc.contributor.mitauthorWang, Ziqiang
dc.contributor.mitauthorSong, Yi
dc.contributor.mitauthorYu, Lili
dc.contributor.mitauthorHuang, Shengxi
dc.contributor.mitauthorFang, Wenjing
dc.contributor.mitauthorZhang, Xu
dc.contributor.mitauthorHsu, Allen Long
dc.contributor.mitauthorBie, Yaqing
dc.contributor.mitauthorLi, Ju
dc.contributor.mitauthorJarillo-Herrero, Pablo
dc.contributor.mitauthorDresselhaus, Mildred
dc.contributor.mitauthorPalacios, Tomas
dc.contributor.mitauthorKong, Jing
dc.relation.journalAdvanced Materialsen_US
dc.eprint.versionOriginal manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/NonPeerRevieweden_US
dspace.orderedauthorsLing, Xi: Lin, Yuxuan; Ma, Qiong; Wang, Ziqiang; Song, Yi; Yu, Lili; Huang, Shengxi; Fang, Wenjing; Zhang, Xu; Hsu, Allen L.; Bie, Yaqing; Lee, Yi-Hsien; Zhu, Yimei; Wu, Lijun; Li, Ju; Jarillo-Herrero, Pablo; Dresselhaus, Mildred; Palacios, Tomás; Kong, Jingen_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0002-1955-3081
dc.identifier.orcidhttps://orcid.org/0000-0003-0638-2620
dc.identifier.orcidhttps://orcid.org/0000-0002-5103-6973
dc.identifier.orcidhttps://orcid.org/0000-0002-2354-302X
dc.identifier.orcidhttps://orcid.org/0000-0002-5603-7991
dc.identifier.orcidhttps://orcid.org/0000-0001-5777-8364
dc.identifier.orcidhttps://orcid.org/0000-0002-3618-9074
dc.identifier.orcidhttps://orcid.org/0000-0002-3416-3962
dc.identifier.orcidhttps://orcid.org/0000-0001-7409-2444
dc.identifier.orcidhttps://orcid.org/0000-0002-7841-8058
dc.identifier.orcidhttps://orcid.org/0000-0001-8217-8213
dc.identifier.orcidhttps://orcid.org/0000-0001-8492-2261
dc.identifier.orcidhttps://orcid.org/0000-0002-2190-563X
dc.identifier.orcidhttps://orcid.org/0000-0003-0551-1208
mit.licenseOPEN_ACCESS_POLICYen_US


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