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High-Throughput Fabrication of Resonant Metamaterials with Ultrasmall Coaxial Apertures via Atomic Layer Lithography

Author(s)
Yoo, Daehan; Martin-Moreno, Luis; Mohr, Daniel A.; Carretero-Palacios, Sol; Shaver, Jonah; Ebbesen, Thomas W.; Oh, Sang-Hyun; Nguyen, Ngoc Cuong; Peraire, Jaime; ... Show more Show less
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Abstract
We combine atomic layer lithography and glancing-angle ion polishing to create wafer-scale metamaterials composed of dense arrays of ultrasmall coaxial nanocavities in gold films. This new fabrication scheme makes it possible to shrink the diameter and increase the packing density of 2 nm-gap coaxial resonators, an extreme subwavelength structure first manufactured via atomic layer lithography, both by a factor of 100 with respect to previous studies. We demonstrate that the nonpropagating zeroth-order Fabry-Pérot mode, which possesses slow light-like properties at the cutoff resonance, traps infrared light inside 2 nm gaps (gap volume ∼ λ[superscript]3/10[superscript 6]). Notably, the annular gaps cover only 3% or less of the metal surface, while open-area normalized transmission is as high as 1700% at the epsilon-near-zero (ENZ) condition. The resulting energy accumulation alongside extraordinary optical transmission can benefit applications in nonlinear optics, optical trapping, and surface-enhanced spectroscopies. Furthermore, because the resonance wavelength is independent of the cavity length and dramatically red shifts as the gap size is reduced, large-area arrays can be constructed with λresonance ≫ period, making this fabrication method ideal for manufacturing resonant metamaterials.
Date issued
2016-02
URI
http://hdl.handle.net/1721.1/105728
Department
Massachusetts Institute of Technology. Department of Aeronautics and Astronautics
Journal
Nano Letters
Publisher
American Chemical Society (ACS)
Citation
Yoo, Daehan et al. “High-Throughput Fabrication of Resonant Metamaterials with Ultrasmall Coaxial Apertures via Atomic Layer Lithography.” Nano Letters 16.3 (2016): 2040–2046. © 2016 American Chemical Society
Version: Final published version
ISSN
1530-6984
1530-6992

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