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dc.contributor.authorSantos, Elton J. G.
dc.contributor.authorYu, Lili
dc.contributor.authorZubair, Ahmad
dc.contributor.authorZhang, Xu
dc.contributor.authorLin, Yuxuan
dc.contributor.authorZhang, Yuhao
dc.contributor.authorPalacios, Tomas
dc.date.accessioned2017-04-25T13:45:59Z
dc.date.available2017-04-25T13:45:59Z
dc.date.issued2015-07
dc.date.submitted2015-02
dc.identifier.issn1530-6984
dc.identifier.issn1530-6992
dc.identifier.urihttp://hdl.handle.net/1721.1/108391
dc.description.abstractBecause of their extraordinary structural and electrical properties, two-dimensional materials are currently being pursued for applications such as thin-film transistors and integrated circuit. One of the main challenges that still needs to be overcome for these applications is the fabrication of air-stable transistors with industry-compatible complementary metal oxide semiconductor (CMOS) technology. In this work, we experimentally demonstrate a novel high performance air-stable WSe₂ CMOS technology with almost ideal voltage transfer characteristic, full logic swing and high noise margin with different supply voltages. More importantly, the inverter shows large voltage gain (∼38) and small static power (picowatts), paving the way for low power electronic system in 2D materials.en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (TG-DMR120049)en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (TG-PHY120021)en_US
dc.language.isoen_US
dc.publisherAmerican Chemical Society (ACS)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1021/acs.nanolett.5b00668en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceProf. Palacios via Phoebe Ayersen_US
dc.titleHigh-Performance WSe 2 Complementary Metal Oxide Semiconductor Technology and Integrated Circuitsen_US
dc.typeArticleen_US
dc.identifier.citationYu, Lili; Zubair, Ahmad; Santos, Elton J. G.; Zhang, Xu; Lin, Yuxuan; Zhang, Yuhao and Palacios, Tomás. “ High-Performance WSe 2 Complementary Metal Oxide Semiconductor Technology and Integrated Circuits .” Nano Letters 15, no. 8 (August 2015): 4928–4934. © 2015 American Chemical Societyen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.approverPalacios, Tomasen_US
dc.contributor.mitauthorYu, Lili
dc.contributor.mitauthorZubair, Ahmad
dc.contributor.mitauthorZhang, Xu
dc.contributor.mitauthorLin, Yuxuan
dc.contributor.mitauthorZhang, Yuhao
dc.contributor.mitauthorPalacios, Tomas
dc.relation.journalNano Lettersen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsYu, Lili; Zubair, Ahmad; Santos, Elton J. G.; Zhang, Xu; Lin, Yuxuan; Zhang, Yuhao; Palacios, Tomásen_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0001-5777-8364
dc.identifier.orcidhttps://orcid.org/0000-0001-9827-3557
dc.identifier.orcidhttps://orcid.org/0000-0002-0388-8311
dc.identifier.orcidhttps://orcid.org/0000-0003-0638-2620
dc.identifier.orcidhttps://orcid.org/0000-0002-2849-5653
dc.identifier.orcidhttps://orcid.org/0000-0002-2190-563X
mit.licensePUBLISHER_POLICYen_US


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