| dc.contributor.author | Skirlo, Scott A. | |
| dc.contributor.author | Lu, Ling | |
| dc.contributor.author | Soljacic, Marin | |
| dc.date.accessioned | 2017-04-27T13:19:27Z | |
| dc.date.available | 2017-04-27T13:19:27Z | |
| dc.date.issued | 2015-02 | |
| dc.date.submitted | 2014-11 | |
| dc.identifier.issn | 2166-2746 | |
| dc.identifier.issn | 2166-2754 | |
| dc.identifier.uri | http://hdl.handle.net/1721.1/108443 | |
| dc.description.abstract | The authors define a new class of binary matrices by maximizing the peak-sidelobe distances in the aperiodic autocorrelations. These matrices can be used as robust position marks for in-plane translational spatial alignment. The optimal square matrices of dimensions up to 7 × 7 and optimal diagonally symmetric matrices of 8 × 8 and 9 × 9 were found by exhaustive searches. | en_US |
| dc.description.sponsorship | United States. Army Research Office (W911NF-13-D-0001) | en_US |
| dc.description.sponsorship | National Science Foundation (U.S.) (DMR-1419807) | en_US |
| dc.description.sponsorship | United States. Department of Energy (DE-SC0001299) | en_US |
| dc.language.iso | en_US | |
| dc.publisher | American Vacuum Society (AVS) | en_US |
| dc.relation.isversionof | http://dx.doi.org/10.1116/1.4913316 | en_US |
| dc.rights | Creative Commons Attribution-Noncommercial-Share Alike | en_US |
| dc.rights.uri | http://creativecommons.org/licenses/by-nc-sa/4.0/ | en_US |
| dc.source | MIT Web Domain | en_US |
| dc.title | Binary matrices of optimal autocorrelations as alignment marks | en_US |
| dc.type | Article | en_US |
| dc.identifier.citation | Skirlo, Scott A.; Lu, Ling and Soljačić, Marin. "Binary matrices of optimal autocorrelations as alignment marks." Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 33, no. 2 (February 2015). | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Physics | en_US |
| dc.contributor.mitauthor | Skirlo, Scott A. | |
| dc.contributor.mitauthor | Lu, Ling | |
| dc.contributor.mitauthor | Soljacic, Marin | |
| dc.relation.journal | Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena | en_US |
| dc.eprint.version | Author's final manuscript | en_US |
| dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
| eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
| dspace.orderedauthors | Skirlo, Scott A.; Lu, Ling; Soljačić, Marin | en_US |
| dspace.embargo.terms | N | en_US |
| dc.identifier.orcid | https://orcid.org/0000-0003-3438-7234 | |
| dc.identifier.orcid | https://orcid.org/0000-0002-7184-5831 | |
| mit.license | OPEN_ACCESS_POLICY | en_US |
