Controlled fabrication of nanoscale gaps using stiction
Author(s)Niroui, Farnaz; Sletten, Ellen M.; Deotare, Parag Bhaskar; Wang, Annie I; Swager, Timothy M; Lang, Jeffrey H; Bulovic, Vladimir; ... Show more Show less
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Utilizing stiction, a common failure mode in micro/nano electromechanical systems (M/NEMS), we propose a method for the controlled fabrication of nanometer-thin gaps between electrodes. In this approach, a single lithography step is used to pattern cantilevers that undergo lateral motion towards opposing stationary electrodes separated by a defined gap. Upon wet developing of the pattern, capillary forces induce cantilever deflection and collapse leading to permanent adhesion between the tip and an opposing support structure. The deflection consequently reduces the separation gap between the cantilever and the electrodes neighboring the point of stiction to dimensions smaller than originally patterned. Through nanoscale force control achieved by altering device design, we demonstrate the fabrication of nanogaps having controlled widths smaller than 15 nm. We further discuss optimization of these nanoscale gaps for applications in NEM and molecular devices.
DepartmentMassachusetts Institute of Technology. Department of Chemistry; Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science; Massachusetts Institute of Technology. Research Laboratory of Electronics
2015 28th IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
Institute of Electrical and Electronics Engineers (IEEE)
Niroui, Farnaz, Ellen M. Sletten, Parag B. Deotare, Annie I. Wang, Timothy M. Swager, Jeffrey H. Lang, and Vladimir Bulovic. “Controlled Fabrication of Nanoscale Gaps Using Stiction.” 2015 28th IEEE International Conference on Micro Electro Mechanical Systems (MEMS) (January 18-22, 2015), Estoril, Portugal.
Author's final manuscript
INSPEC Accession Number: 14949382