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dc.contributor.authorXu, Yishuai
dc.contributor.authorChiu, Janet
dc.contributor.authorMiao, Lin
dc.contributor.authorHe, Haowei
dc.contributor.authorKapitulnik, A.
dc.contributor.authorBiswas, Rudro R.
dc.contributor.authorWray, L. Andrew
dc.contributor.authorAlpichshev, Zhanybek
dc.date.accessioned2017-06-21T13:10:01Z
dc.date.available2017-06-21T13:10:01Z
dc.date.issued2017-02
dc.date.submitted2016-06
dc.identifier.issn2041-1723
dc.identifier.urihttp://hdl.handle.net/1721.1/110095
dc.description.abstractThree-dimensional topological insulators are bulk insulators with Z2 topological electronic order that gives rise to conducting light-like surface states. These surface electrons are exceptionally resistant to localization by non-magnetic disorder, and have been adopted as the basis for a wide range of proposals to achieve new quasiparticle species and device functionality. Recent studies have yielded a surprise by showing that in spite of resisting localization, topological insulator surface electrons can be reshaped by defects into distinctive resonance states. Here we use numerical simulations and scanning tunnelling microscopy data to show that these resonance states have significance well beyond the localized regime usually associated with impurity bands. At native densities in the model Bi₂X₃ (X=Bi, Te) compounds, defect resonance states are predicted to generate a new quantum basis for an emergent electron gas that supports diffusive electrical transport.en_US
dc.language.isoen_US
dc.publisherNature Publishing Groupen_US
dc.relation.isversionofhttp://dx.doi.org/10.1038/ncomms14081en_US
dc.rightsCreative Commons Attribution 4.0 International Licenseen_US
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/en_US
dc.sourceNatureen_US
dc.titleDisorder enabled band structure engineering of a topological insulator surfaceen_US
dc.typeArticleen_US
dc.identifier.citationXu, Yishuai; Chiu, Janet; Miao, Lin; He, Haowei; Alpichshev, Zhanybek; Kapitulnik, A.; Biswas, Rudro R. and Wray, L. Andrew. “Disorder Enabled Band Structure Engineering of a Topological Insulator Surface.” Nature Communications 8 (February 2017): 14081 © 2017 The Author(s)en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Physicsen_US
dc.contributor.mitauthorAlpichshev, Zhanybek
dc.relation.journalNature Communicationsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsXu, Yishuai; Chiu, Janet; Miao, Lin; He, Haowei; Alpichshev, Zhanybek; Kapitulnik, A.; Biswas, Rudro R.; Wray, L. Andrewen_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0002-7183-5203
mit.licensePUBLISHER_CCen_US
mit.metadata.statusComplete


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