dc.contributor.author | Xing, Weichuan | |
dc.contributor.author | Liu, Zhihong | |
dc.contributor.author | Ng, Geok Ing | |
dc.contributor.author | Palacios, Tomas | |
dc.date.accessioned | 2017-09-18T17:59:59Z | |
dc.date.available | 2017-09-18T17:59:59Z | |
dc.date.issued | 2016-03 | |
dc.date.submitted | 2015-07 | |
dc.identifier.issn | 1877-7058 | |
dc.identifier.uri | http://hdl.handle.net/1721.1/111595 | |
dc.description.abstract | This work presents a 100 nm-gate InAlN/GaN HEMT with current-gain cutoff frequency (f[subscript T]) up to 120 GHz at room temperature (25 °C). Temperature dependent DC and RF characteristics are measured from 25 °C to 200 °C. The maximum drain current (I[subscript d−max]) decreases from 1247 mA/mm to 927 mA/mm as the temperature increases from 25 °C to 200 °C. For maximum f[subscript T], it drops to 87 GHz and 64 GHz at 100°C and 200°C respectively. These results show that although both DC and RF performances decrease with the increase in temperature, the device still exhibits high mm-wave performance at high temperatures. Thus, InAlN/GaN based HEMTs are very promising for high temperature mm-wave applications. | en_US |
dc.language.iso | en_US | |
dc.publisher | Elsevier | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1016/j.proeng.2015.09.222 | en_US |
dc.rights | Creative Commons Attribution-NonCommercial-NoDerivs License | en_US |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/4.0/ | en_US |
dc.source | Elsevier | en_US |
dc.title | Temperature Dependent Characteristics of InAlN/GaN HEMTs for mm-Wave Applications | en_US |
dc.type | Article | en_US |
dc.identifier.citation | Xing, Weichuan et al. “Temperature Dependent Characteristics of InAlN/GaN HEMTs for Mm-Wave Applications.” Procedia Engineering 141 (2016): 103–107 © 2016 The Authors | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | en_US |
dc.contributor.mitauthor | Palacios, Tomas | |
dc.relation.journal | Procedia Engineering | en_US |
dc.eprint.version | Final published version | en_US |
dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
dspace.orderedauthors | Xing, Weichuan; Liu, Zhihong; Ng, Geok Ing; Palacios, Tomas | en_US |
dspace.embargo.terms | N | en_US |
dc.identifier.orcid | https://orcid.org/0000-0002-2190-563X | |
mit.license | PUBLISHER_CC | en_US |
mit.metadata.status | Complete | |