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dc.contributor.authorXing, Weichuan
dc.contributor.authorLiu, Zhihong
dc.contributor.authorNg, Geok Ing
dc.contributor.authorPalacios, Tomas
dc.date.accessioned2017-09-18T17:59:59Z
dc.date.available2017-09-18T17:59:59Z
dc.date.issued2016-03
dc.date.submitted2015-07
dc.identifier.issn1877-7058
dc.identifier.urihttp://hdl.handle.net/1721.1/111595
dc.description.abstractThis work presents a 100 nm-gate InAlN/GaN HEMT with current-gain cutoff frequency (f[subscript T]) up to 120 GHz at room temperature (25 °C). Temperature dependent DC and RF characteristics are measured from 25 °C to 200 °C. The maximum drain current (I[subscript d−max]) decreases from 1247 mA/mm to 927 mA/mm as the temperature increases from 25 °C to 200 °C. For maximum f[subscript T], it drops to 87 GHz and 64 GHz at 100°C and 200°C respectively. These results show that although both DC and RF performances decrease with the increase in temperature, the device still exhibits high mm-wave performance at high temperatures. Thus, InAlN/GaN based HEMTs are very promising for high temperature mm-wave applications.en_US
dc.language.isoen_US
dc.publisherElsevieren_US
dc.relation.isversionofhttp://dx.doi.org/10.1016/j.proeng.2015.09.222en_US
dc.rightsCreative Commons Attribution-NonCommercial-NoDerivs Licenseen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/en_US
dc.sourceElsevieren_US
dc.titleTemperature Dependent Characteristics of InAlN/GaN HEMTs for mm-Wave Applicationsen_US
dc.typeArticleen_US
dc.identifier.citationXing, Weichuan et al. “Temperature Dependent Characteristics of InAlN/GaN HEMTs for Mm-Wave Applications.” Procedia Engineering 141 (2016): 103–107 © 2016 The Authorsen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.mitauthorPalacios, Tomas
dc.relation.journalProcedia Engineeringen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsXing, Weichuan; Liu, Zhihong; Ng, Geok Ing; Palacios, Tomasen_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0002-2190-563X
mit.licensePUBLISHER_CCen_US
mit.metadata.statusComplete


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