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dc.contributor.authorArutt, Charles N
dc.contributor.authorAlles, Michael L
dc.contributor.authorLiao, Wenjun
dc.contributor.authorGong, Huiqi
dc.contributor.authorDavidson, Jim L
dc.contributor.authorSchrimpf, Ronald D
dc.contributor.authorReed, Robert A
dc.contributor.authorWeller, Robert A
dc.contributor.authorBolotin, Kirill
dc.contributor.authorNicholl, Ryan
dc.contributor.authorPham, Thang Toan
dc.contributor.authorZettl, Alex
dc.contributor.authorLi, Mo
dc.contributor.authorAlphenaar, Bruce W
dc.contributor.authorLin, Ji-Tzuoh
dc.contributor.authorShurva, Pranoy Deb
dc.contributor.authorMcNamara, Shamus
dc.contributor.authorWalsh, Kevin M
dc.contributor.authorFeng, Philip X-L
dc.contributor.authorHutin, Louis
dc.contributor.authorErnst, Thomas
dc.contributor.authorHomeijer, Brian D
dc.contributor.authorPolcawich, Ronald G
dc.contributor.authorProie, Robert M
dc.contributor.authorJones, Jacob L
dc.contributor.authorGlaser, Evan R
dc.contributor.authorCress, Cory D
dc.contributor.authorBassiri-Gharb, Nazanin
dc.contributor.authorDu, Qingyang
dc.contributor.authorHu, Juejun
dc.date.accessioned2017-12-08T14:52:06Z
dc.date.available2017-12-08T14:52:06Z
dc.date.issued2016-12
dc.date.submitted2016-10
dc.identifier.issn0268-1242
dc.identifier.issn1361-6641
dc.identifier.urihttp://hdl.handle.net/1721.1/112648
dc.description.abstractThe potential of micro and nano electromechanical systems (M and NEMS) has expanded due to advances in materials and fabrication processes. A wide variety of materials are now being pursued and deployed for M and NEMS including silicon carbide (SiC), III–V materials, thin-film piezoelectric and ferroelectric, electro-optical and 2D atomic crystals such as graphene, hexagonal boron nitride (h-BN), and molybdenum disulfide (MoS₂). The miniaturization, functionality and low-power operation offered by these types of devices are attractive for many application areas including physical sciences, medical, space and military uses, where exposure to radiation is a reliability consideration. Understanding the impact of radiation on these materials and devices is necessary for applications in radiation environments.en_US
dc.description.sponsorshipDefense Threat Reduction Agency (DTRA) (Grant HDTRA1-15-1-0027)en_US
dc.description.sponsorshipDefense Threat Reduction Agency (DTRA) (Grant HDTRA1-15-1-0035)en_US
dc.description.sponsorshipDefense Threat Reduction Agency (DTRA) (Grant HDTRA1-15-1-0036)en_US
dc.description.sponsorshipDefense Threat Reduction Agency (DTRA) (Grant HDTRA1-15-1-0039)en_US
dc.description.sponsorshipDefense Threat Reduction Agency (DTRA) (Grant HDTRA1-15-1-0060)en_US
dc.language.isoen_US
dc.publisherIOP Publishingen_US
dc.relation.isversionofhttps://doi.org/10.1088/1361-6641/32/1/013005en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alikeen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/4.0/en_US
dc.sourceProf. Hu via Erja Kajosaloen_US
dc.titleThe study of radiation effects in emerging micro and nano electro mechanical systems (M and NEMs)en_US
dc.typeArticleen_US
dc.identifier.citationArutt, Charles N et al. “The Study of Radiation Effects in Emerging Micro and Nano Electro Mechanical Systems (M and NEMs).” Semiconductor Science and Technology 32, 1 (December 2016): 013005 © 2016 IOP Publishing Ltden_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.approverHu, Juejunen_US
dc.contributor.mitauthorDu, Qingyang
dc.contributor.mitauthorHu, Juejun
dc.relation.journalSemiconductor Science and Technologyen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsArutt, Charles N; Alles, Michael L; Liao, Wenjun; Gong, Huiqi; Davidson, Jim L; Schrimpf, Ronald D; Reed, Robert A; Weller, Robert A; Bolotin, Kirill; Nicholl, Ryan; Pham, Thang Toan; Zettl, Alex; Qingyang, Du; Hu, Juejun; Li, Mo; Alphenaar, Bruce W; Lin, Ji-Tzuoh; Shurva, Pranoy Deb; McNamara, Shamus; Walsh, Kevin M; Feng, Philip X-L; Hutin, Louis; Ernst, Thomas; Homeijer, Brian D; Polcawich, Ronald G; Proie, Robert M; Jones, Jacob L; Glaser, Evan R; Cress, Cory D; Bassiri-Gharb, Nazaninen_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0002-1424-356X
dc.identifier.orcidhttps://orcid.org/0000-0002-7233-3918
mit.licenseOPEN_ACCESS_POLICYen_US


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