dc.contributor.author | Siemens, Mark E. | |
dc.contributor.author | Li, Qing | |
dc.contributor.author | Yang, Ronggui | |
dc.contributor.author | Anderson, Erik H. | |
dc.contributor.author | Murnane, Margaret M. | |
dc.contributor.author | Kapteyn, Henry C. | |
dc.contributor.author | Nelson, Keith Adam | |
dc.date.accessioned | 2018-02-05T15:48:08Z | |
dc.date.available | 2018-02-05T15:48:08Z | |
dc.date.issued | 2011-02 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.issn | 1996-756X | |
dc.identifier.uri | http://hdl.handle.net/1721.1/113414 | |
dc.description.abstract | Heat dissipation from a nanoscale hot-spot is expected to be non-diffusive when a hot-spot is smaller than the phonon mean free path of the substrate. Our technique of observing diffraction of coherent soft x-ray pulses allows for very high resolution (∼pm) of thermally-induced surface distortion, as well as femtosecond time resolution of dynamics. We successfully model our experimental results with a diffusive transport model that is modified to include an additional boundary resistance. These results confirm the importance of considering ballistic transport away from a nanoscale heat source, and identify a means of correctly accounting for this ballistic transport. | en_US |
dc.publisher | SPIE | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1117/12.871455 | en_US |
dc.rights | Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. | en_US |
dc.source | SPIE | en_US |
dc.title | Quasi-ballistic thermal transport from nanoscale interfaces observed using ultrafast coherent soft x-ray beams | en_US |
dc.type | Article | en_US |
dc.identifier.citation | Siemens, Mark E. et al “Quasi-Ballistic Thermal Transport from Nanoscale Interfaces Observed Using Ultrafast Coherent Soft x-Ray Beams.” Edited by Kong-Thon Tsen, Jin-Joo Song, Markus Betz, and Abdulhakem Y. Elezzabi. Ultrafast Phenomena in Semiconductors and Nanostructure Materials XV 7937 (February 2011): 793716 © 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE) | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Chemistry | en_US |
dc.contributor.mitauthor | Nelson, Keith Adam | |
dc.relation.journal | Proceedings of SPIE--the Society of Photo-Optical Instrumentation Engineers | en_US |
dc.eprint.version | Final published version | en_US |
dc.type.uri | http://purl.org/eprint/type/ConferencePaper | en_US |
eprint.status | http://purl.org/eprint/status/NonPeerReviewed | en_US |
dc.date.updated | 2018-02-01T12:02:23Z | |
dspace.orderedauthors | Siemens, Mark E.; Li, Qing; Yang, Ronggui; Nelson, Keith A.; Anderson, Erik H.; Murnane, Margaret M.; Kapteyn, Henry C. | en_US |
dspace.embargo.terms | N | en_US |
dc.identifier.orcid | https://orcid.org/0000-0001-7804-5418 | |
mit.license | PUBLISHER_POLICY | en_US |