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dc.contributor.authorSiemens, Mark E.
dc.contributor.authorLi, Qing
dc.contributor.authorYang, Ronggui
dc.contributor.authorAnderson, Erik H.
dc.contributor.authorMurnane, Margaret M.
dc.contributor.authorKapteyn, Henry C.
dc.contributor.authorNelson, Keith Adam
dc.date.accessioned2018-02-05T15:48:08Z
dc.date.available2018-02-05T15:48:08Z
dc.date.issued2011-02
dc.identifier.issn0277-786X
dc.identifier.issn1996-756X
dc.identifier.urihttp://hdl.handle.net/1721.1/113414
dc.description.abstractHeat dissipation from a nanoscale hot-spot is expected to be non-diffusive when a hot-spot is smaller than the phonon mean free path of the substrate. Our technique of observing diffraction of coherent soft x-ray pulses allows for very high resolution (∼pm) of thermally-induced surface distortion, as well as femtosecond time resolution of dynamics. We successfully model our experimental results with a diffusive transport model that is modified to include an additional boundary resistance. These results confirm the importance of considering ballistic transport away from a nanoscale heat source, and identify a means of correctly accounting for this ballistic transport.en_US
dc.publisherSPIEen_US
dc.relation.isversionofhttp://dx.doi.org/10.1117/12.871455en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceSPIEen_US
dc.titleQuasi-ballistic thermal transport from nanoscale interfaces observed using ultrafast coherent soft x-ray beamsen_US
dc.typeArticleen_US
dc.identifier.citationSiemens, Mark E. et al “Quasi-Ballistic Thermal Transport from Nanoscale Interfaces Observed Using Ultrafast Coherent Soft x-Ray Beams.” Edited by Kong-Thon Tsen, Jin-Joo Song, Markus Betz, and Abdulhakem Y. Elezzabi. Ultrafast Phenomena in Semiconductors and Nanostructure Materials XV 7937 (February 2011): 793716 © 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE)en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemistryen_US
dc.contributor.mitauthorNelson, Keith Adam
dc.relation.journalProceedings of SPIE--the Society of Photo-Optical Instrumentation Engineersen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/ConferencePaperen_US
eprint.statushttp://purl.org/eprint/status/NonPeerRevieweden_US
dc.date.updated2018-02-01T12:02:23Z
dspace.orderedauthorsSiemens, Mark E.; Li, Qing; Yang, Ronggui; Nelson, Keith A.; Anderson, Erik H.; Murnane, Margaret M.; Kapteyn, Henry C.en_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0001-7804-5418
mit.licensePUBLISHER_POLICYen_US


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