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dc.contributor.authorEnright, Ryan
dc.contributor.authorChu, Kuang-Han
dc.contributor.authorJoung, Young soo
dc.contributor.authorBuie, Cullen
dc.contributor.authorWang, Evelyn
dc.date.accessioned2018-11-13T17:08:35Z
dc.date.available2018-11-13T17:08:35Z
dc.date.issued2013-04
dc.date.submitted2013-02
dc.identifier.issn0003-6951
dc.identifier.issn1077-3118
dc.identifier.urihttp://hdl.handle.net/1721.1/118990
dc.description.abstractWe report large enhancements in critical heat flux (CHF) on hierarchically structured surfaces, fabricated using electrophoretic deposition of silica nanoparticles on microstructured silicon and electroplated copper microstructures covered with copper oxide (CuO) nanostructures. A critical heat flux of ≈250 W/cm² was achieved on a CuO hierarchical surface with a roughness factor of 13.3, and good agreement between the model proposed in our recent study and the current data was found. These results highlight the important role of roughness using structures at multiple length scales for CHF enhancement. This high heat removal capability promises an opportunity for high flux thermal management.en_US
dc.publisherAmerican Institute of Physics (AIP)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.4801811en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceOther repositoryen_US
dc.titleHierarchically structured surfaces for boiling critical heat flux enhancementen_US
dc.typeArticleen_US
dc.identifier.citationChu, Kuang-Han et al. “Hierarchically Structured Surfaces for Boiling Critical Heat Flux Enhancement.” Applied Physics Letters 102, 15 (April 2013): 151602 © 2013 AIP Publishingen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.mitauthorChu, Kuang-Han
dc.contributor.mitauthorJoung, Young soo
dc.contributor.mitauthorBuie, Cullen
dc.contributor.mitauthorWang, Evelyn
dc.relation.journalApplied Physics Lettersen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2018-10-30T20:06:45Z
dspace.orderedauthorsChu, Kuang-Han; Soo Joung, Young; Enright, Ryan; Buie, Cullen R.; Wang, Evelyn N.en_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0002-2623-5778
dc.identifier.orcidhttps://orcid.org/0000-0002-2275-4570
dc.identifier.orcidhttps://orcid.org/0000-0001-7045-1200
mit.licensePUBLISHER_POLICYen_US


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